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US 9,809,892 B1Granted
Indium electroplating compositions containing 1,10-phenanthroline compounds and methods of electroplating indium
AssigneeRohm and Haas Electronic Materials LLC
InventorsYi Qin, Kristen Flajslik, Mark Lefebvre
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Abstract
Iridium electroplating compositions containing 1,10-phenanthroline compounds in trace amounts to electroplate substantially defect-free uniform and smooth surface morphology indium on metal layers. The indium electroplating compositions can be used to electroplate indium metal on metal layers of various substrates such as semiconductor wafers and as thermal interface materials.
Claims6
A method comprising:
- a) providing a substrate comprising a metal layer;
- b) contacting the substrate with an indium electroplating composition comprising one or more sources of indium ions, one or more 1,10-phenanthroline compounds in amounts of 0.1 ppm to 15 ppm and citric acid, salt of citric acid or mixtures thereof;
- and
- c) electroplating an indium metal layer on the metal layer of the substrate with the indium electroplating composition.
1 more element
Dependencies are inferred from the claim text.