Atomic layer deposition apparatus

An atomic layer deposition apparatus comprising:

• a chamber;
• a first base plate which is arranged inside the chamber and on which a seat portion is defined to allow a substrate to be seated thereon;
• a second base plate disposed opposite to the first base plate;
• a first gas nozzle portion arranged on the second base plate and extending in a first direction;
• a second gas nozzle portion arranged on the second base plate to be spaced apart from the first gas nozzle portion and extending in a first direction;
• a plurality of injection holes disposed on the first gas nozzle portion and the second gas nozzle portion;
• and
• wherein the first base plate and the second base plate contact each other and form a space to which the first gas nozzle portion and the second gas nozzle connected,
• wherein the plurality of injection holes are aligned in the first direction, and
• wherein the space is opened in a second direction which is perpendicular to the first direction,
• wherein
• the first base plate comprises:
• a first reference surface;
• and
• a first recessed groove recessed from the first reference surface and having an open side,
• the second base plate comprises:
• a second reference surface;
• and
• a second recessed groove recessed from the second reference surface and having an open side,
• the first recessed groove and the second recessed groove define a reaction space including an opening when the first base plate and the second base plate are disposed to contact each other,
• the seat portion is on the first base plate in the reaction space, and
• the first gas nozzle portion and the second gas nozzle portion are arranged on the second base plate in the reaction space.