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US 9,809,877 B2Granted
Ion implantation apparatus with ion beam directing unit
AssigneeInfineon Technologies AG
InventorsAlexander Breymesser, Stephan Voss, Hans-Joachim Schulze, Werner Schustereder
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Abstract
An ion implantation apparatus includes an ion beam directing unit, a substrate support, and a controller. The controller is configured to effect a relative movement between an ion beam passing the ion beam directing unit and the substrate support. A beam track of the ion beam on a substrate mounted on the substrate support includes circles or a spiral.
Claims5
An ion implantation apparatus, comprising:
- an ion beam directing unit;
- a substrate support;
- a controller configured to effect a relative movement between an ion beam passing the ion beam directing unit and the substrate support, wherein a beam track of the ion beam on a substrate mounted on the substrate support includes circles or a spiral in a plane;
- and
- a controllable motor drive unit configured to rotate the substrate support in a plane slanted by at most 10 degree with respect to a plane perpendicular to the ion beam.
2 more elements
An ion implantation apparatus, comprising:
- an ion beam directing unit;
- a substrate support;
- and
- a controller configured to effect a relative movement between an ion beam passing the ion beam directing unit and the substrate support, wherein a beam track of the ion beam on a substrate mounted on the substrate support includes circles or a spiral in a plane, and configured to at least one of radially modifying a distance between successive beam tracks and radially modifying a rotational speed of the ion beam track to obtain a rotational-symmetric implant dose with radially varying implant dose.
1 more element
Dependencies are inferred from the claim text.