US 9,809,711 B2 · Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process

Abstract

A stable formulation comprising a silicon containing precursor selected from an alkoxysilane, aryloxysilane, or alkylalkoxysilane and a catalyst compound comprising a haloalkoxyalkylsilane or haloaryloxyalkylsilane wherein the substitutents within the silicon-containing precursor and catalyst compound are the same are described herein. More specifically, the formulation comprises a silicon-containing precursor comprising an alkoxyalkylsilane or aryloxysilane having a formula of Si(OR1)nR24-n and a catalyst comprising haloalkoxyalkylsilane having a formula of XSi(OR1)nR23-n; or a silicon-containing precursor comprising an alkoxysilane or aryloxysilane having a formula of R23-p(R1O)pSi—R3—Si(OR1)pR23-p and a catalyst comprising a haloalkoxyalkylsilane or haloaryloxyalkylsilane having a formula of (R1O)mR22-m(X)Si—R3—Si(OR4)2R5 wherein at least one or all of the R1 and R2 substituents are the same in both the silicon-containing precursor and catalyst compound are described herein. The formulations can be used in semiconductor deposition process, such as for example, a flowable silicon oxide process.

Claims26

Dependent claims

A formulation comprising

(a) a silicon-containing precursor comprising a compound having a formula R23-p(R1O)pSi—R3—Si(OR1)pR23-p and
(b) a catalyst comprising a haloalkoxyalkylsilane having a formula of (R1O)mR22-m(X)Si—R3—Si(OR4)2R5;
wherein R1 and R4 are each independently selected from a C1-C12 linear or branched alkyl group;
a C3-C12 aryl group;
a C3-C12 cycloalkyl group;
a C2-C12 alkenyl group;
and a C2-C12 alkynyl group;
R2 is selected from a C1-C12 linear or branched alkyl group;
a C3-C12 aryl group;
a C3-C12 cycloalkyl group;
a C2-C12 alkenyl group;
a C2-C12 alkynyl group;
and a hydrogen atom;
wherein R1 and R2 may be the same or different;
R3 is selected from a C1-10 alkanediyl group;
a C2-10 alkenediyl group;
a C2-10 alkynediyl group;
a C3-10 cyclic alkanediyl;
a C5-10 cyclic alkenediyl group;
a C6-10 bi-cyclic alkanediyl group;
a C6-10 cyclic alkenediyl group;
a C6-10 arenediyl group;
and R5 is selected from a linear or branched C1-C12 alkyl group;
a C4-C12 aryl group;
a C3-C12 cycloalkyl group;
a C2-C12 alkenyl group;
a C2-C12 alkynyl group;
and a linear or branched C1-C12 alkoxy group;
X is chosen from F, Cl, Br and I;
m is an integer ranging from 1 to 2 inclusive;
and p is an integer ranging from 1 to 3 inclusive;
and wherein R1 in the silicon containing precursor and R1 in the catalyst are the same substituents and the concentration of the silicon-containing precursor and the catalyst does not change by more than 10 wt %, based upon gas chromatography, after storage for a period of one year.

29 more elements

A formulation for use in forming a silicon containing film comprising:

(a) a silicon-containing precursor comprising an alkoxyalkylsilane having a formula of Si(OR1)nR24-n;
and
(b) a catalyst comprising a haloalkoxyalkylsilane having a formula of XSi(OR1)nR23-n;
wherein R1 is selected from the group consisting of a C1-C12 linear or branched alkyl group;
a C3-C12 aryl group, a C3-C12 cycloalkyl group, a C2-C12 alkenyl group, and a C2-C12 alkynyl group;
R2 is selected from the group consisting of a C1-C12 linear or branched alkyl group;
a C3-C12 aryl group;
a C3-C12 cycloalkyl group;
a C2-C12 alkenyl group;
a C2-C12 alkynyl group;
and a hydrogen atom;
wherein when R1 is methyl, R2 is not hydrogen;
n is an integer ranging from 1 to 4 inclusive;
and X is selected from the group consisting 6 of 11 of from F, Cl, Br and I wherein at least one or both of substituents R1 and R2 in the silicon-containing precursor and the R1 and R2 in the catalyst are the same;
wherein the formulation is a fluid and the concentration of the precursor or the catalyst do not compositionally change by more than 10% after storage for one year.

12 more elements

A stable formulation for use in forming a silicon-containing film;

selected from the group consisting of:
(1) a formulation comprising:
(a) a silicon-containing precursor comprising an alkoxyalkylsilane having a formula of Si(OR1)nR24-n;
and (b) a catalyst comprising a haloalkoxyalkylsilane having a formula of XSi(OR1)nR23-n;
wherein R1 is selected from the group consisting of a C1-C12 linear or branched alkyl group;
a C3-C12 aryl group, a C3-C12 cycloalkyl group, a C2-C12 alkenyl group, and a C2-C12 alkynyl group;
R2 is selected from the group consisting of a C1-C12 linear or branched alkyl group;
a C3-C12 aryl group;
a C3-C12 cycloalkyl group;
a C2-C12 alkenyl group;
a C2-C12 alkynyl group;
and a hydrogen atom;
wherein when R1 is methyl, R2 is not hydrogen;
n is an integer ranging from 1 to 4 inclusive;
and X is selected from the group consisting of from F, Cl, Br and I and wherein at least one or both of substituents R1 and R2 in the silicon-containing precursor and the R1 and R2 in the catalyst are the same;
and
(2) a formulation comprising
(a) a silicon-containing precursor comprising a compound having a formula R23-p(R1O)pSi—R3—Si(OR1)pR23-p and
(b) a catalyst comprising a haloalkoxyalkylsilane having a formula of (R1O)mR22-m(X)Si—R3—Si(OR4)2R5;
wherein R1 and R4 are each independently selected from a C1-C12 linear or branched alkyl group;
a C3-C12 aryl group;
a C3-C12 cycloalkyl group;
a C2-C12 alkenyl group;
and a C2-C12 alkynyl group;
R2 is selected from a C1-C12 linear or branched alkyl group;
a C3-C12 aryl group;
a C3-C12 cycloalkyl group;
a C2-C12 alkenyl group;
a C2-C12 alkynyl group;
and a hydrogen atom;
wherein R1 and R2 may be the same or different;
R3 is selected from a C1-10 alkanediyl group;
a C2-10 alkenediyl group;
a C2-10 alkynediyl group;
a C3-10 cyclic alkanediyl;
a C5-10 cyclic alkenediyl group;
a C6-10 bi-cyclic alkanediyl group;
a C6-10 cyclic alkenediyl group;
a C6-10 arenediyl group;
and R5 is selected from a linear or branched C1-C12 alkyl group;
a C4-C12 aryl group;
a C3-C12 cycloalkyl group;
a C2-C12 alkenyl group;
a C2-C12 alkynyl group;
and a linear or branched C1-C12 alkoxy group;
X is chosen from F, Cl, Br and I;
m is an integer ranging from 1 to 2 inclusive;
and p is an integer ranging from 1 to 3 inclusive;
wherein the stable formulation is reactive under chemical vapor conditions to form the silicon containing film.

46 more elements

Dependencies are inferred from the claim text.

Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process

Life of this patent

Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process

Life of this patent

Abstract

Claims26