Salt, resin, resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsHiromu Sakamoto, Koji Ichikawa
Life of this patent
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AssigneeSumitomo Chemical Company, Limited
InventorsHiromu Sakamoto, Koji Ichikawa
Estimating the term…
A salt represented by formula (I): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 each independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, R3 represents a hydrogen atom, a fluorine atom, a C1 to C12 alkyl group or a C1 to C12 fluorinated alkyl group, R4 represents a C1 to C12 fluorinated alkyl group, L2 represents a single bond, a C1 to C12 divalent saturated hydrocarbon group, etc., R5 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a group represented by formula (b1-1), etc., * represents a bonding site to —CR3R4; Lb2 and Lb3 each independently represent a single bond or a C1 to C22 divalent saturated hydrocarbon group; Z+ represents an organic cation.
A salt represented by formula (I):
Dependencies are inferred from the claim text.