Reticle chuck cleaner and reticle chuck cleaning method
AssigneeToshiba Memory Corporation
InventorsYoshihito Kobayashi, Masamitsu Itoh, Taro Inada, Jun Watanabe
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Abstract
There is provided a reticle chuck cleaner A for cleaning a reticle chuck of an apparatus, as a reticle chuck cleaner that allows easy cleaning of a reticle chuck in a vacuum chamber of an apparatus without exposing the chamber to the atmosphere and contributes to improvement of the operating ratio of the apparatus, including: an adhesive layer 1 to be adhered to a chuck region of the reticle chuck; a support layer 2 laminated on the adhesive layer 1; and a substrate 3 having a shape capable of being carried to the reticle chuck, the support layer 2 and the substrate 3 being partially bonded together in an adhesive region 41 of a partial adhesive layer 4.
Claims12
A reticle chuck cleaner for cleaning a reticle chuck of an apparatus, comprising:
- an adhesive layer to be adhered to a chuck region of the reticle chuck;
- a support layer on the adhesive layer;
- and
- a substrate having a shape capable of being carried to the reticle chuck,
- a partial adhesive layer having an adhesive region and a non-adhesive region, the partial adhesive layer provided between the support layer and the substrate,
- wherein the support layer and the substrate are partially bonded by the partial adhesive layer.
Dependencies are inferred from the claim text.