Electrode, accelerator column and ion implantation apparatus including same
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsChristopher Lupoli, Sheri A. Durgin, Daniel McGillicuddy, Victor J. Theriault, Klaus Becker
Life of this patent
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Abstract
An electrode for manipulating an ion beam. The electrode may include an insert having an ion beam aperture to conduct the ion beam therethrough, the insert comprising a first electrically conductive material; a frame disposed around the insert and comprising a second electrically conductive material; and an outer portion, the outer portion disposed around the frame and comprising a third electrically conductive material, wherein the insert is reversibly detachable from the frame, and wherein the frame is reversibly attachable from the outer portion.
Claims19
An electrode for manipulating an ion beam, comprising:
- an insert having an ion beam aperture to conduct the ion beam therethrough, the insert comprising a first electrically conductive material;
- a frame disposed around the insert and comprising a second electrically conductive material;
- and
- an outer portion, the outer portion disposed around the frame and comprising a third electrically conductive material,
- wherein the insert is reversibly attachable from the frame, and wherein the frame is reversibly detachable from the outer portion.
An accelerator column to accelerate an ion beam, comprising:
- an electrode assembly, comprising a first plurality of electrodes, the first plurality of electrodes being electrically isolated from one another;
- wherein a given electrode of the electrode assembly comprises:
- an insert having an in beam aperture to conduct the ion beam therethrough;
- a frame disposed around the insert;
- and
- an outer portion, the outer portion disposed around the frame,
- wherein the insert is reversibly attachable from the frame, wherein the frame is reversibly detachable from the outer portion, and wherein the insert, the frame, and the outer portion are electrically conductive.
An ion implanter, comprising:
- an ion source to generate an ion beam;
- and
- an accelerator column to accelerate the ion beam, the accelerator column disposed downstream of the ion source and comprising:
- a first electrode assembly, comprising a first plurality of electrodes, wherein the first plurality of electrodes are electrically isolated from one another;
- and
- wherein a given electrode of the first electrode assembly comprises:
- an insert having an ion beam aperture to conduct the ion beam therethrough;
- a frame disposed around the insert;
- and
- an outer portion, the outer portion disposed around the frame,
- wherein the insert is reversibly detachable from the frame, wherein the frame is reversibly attachable from the outer portion, and wherein the insert, the frame, and the outer portion are electrically conductive.
Dependencies are inferred from the claim text.