N-type thin film transistor

Abstract

An N-type thin film transistor includes an insulating substrate, a first MgO layer, a semiconductor carbon nanotube layer, a second MgO layer, a functional dielectric layer, a gate electrode, a source electrode and a drain electrode. The first MgO layer is located on the insulating substrate. The semiconductor carbon nanotube layer is located on the first MgO layer. The source electrode and the drain electrode are electrically connected to the semiconductor carbon nanotube layer, wherein the source electrode and the drain electrode are spaced from each other, and a channel is defined in the semiconductor carbon nanotube layer and between the source electrode and the drain electrode. The second MgO layer is located on the semiconductor carbon nanotube layer. The functional dielectric layer covering the second MgO layer. The gate electrode on the functional dielectric layer.

Dependencies are inferred from the claim text.