Patterning devices using fluorinated compounds
AssigneeThe Johns Hopkins University
InventorsHoward E. Katz, Bal Mukund Dhar
Life of this patent
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Abstract
A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a fluorinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.
Claims9
A method for producing a spatially patterned structure, comprising:
- forming a fluorinated material layer over a substructure;
- forming a layer of a photoresist on said fluorinated material layer;
- exposing said photoresist to spatially patterned radiation;
- developing said photoresist to substantially remove one of exposed or unexposed regions of said photoresist to provide a pattern of uncovered regions of said fluorinated material layer between regions covered by said photoresist;
- and
- removing said uncovered regions of fluorinated material layer using a fluorinated solvent to provide a patterned fluorinated material layer.
Dependencies are inferred from the claim text.