Substrate imprinted with a pattern for forming isolated device regions
AssigneeApplied Materials, Inc.
InventorsJames A. Brug, Lihua Zhao, Carl A. Taussig
Life of this patent
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AssigneeApplied Materials, Inc.
InventorsJames A. Brug, Lihua Zhao, Carl A. Taussig
Estimating the term…
An example provides a method for forming an apparatus including a substrate imprinted with a pattern for forming isolated device regions. A method may include imprinting an unpatterned area of a substrate with a pattern to form a patterned substrate having a plurality of recessed regions at a first level and a plurality of elevated regions at a second level, and depositing a first layer of conductive material over the patterned substrate with a plurality of breaks to form a plurality of bottom electrodes. The method may include depositing a layer of an active stack, with a second layer of conductive material, over the plurality of bottom electrodes to form a plurality of devices on the plurality of recessed regions isolated from each other by the plurality of elevated regions.
An apparatus comprising:
A system comprising:
An apparatus comprising:
Dependencies are inferred from the claim text.