Substrate structure and manufacturing method thereof

A substrate structure, comprising:

• a dielectric material layer;
• a first conductive wiring layer disposed on a first surface of the dielectric material layer;
• a second conductive wiring layer disposed on a second surface of the dielectric material layer;
• a metal core layer, disposed inside the dielectric material layer, having at least one metal part, which has two sidewalls, and at least one of the sidewalls has a curved surface with a chamfer angle;
• a first conductive pillar layer, disposed inside the dielectric material layer and between the metal core layer and the first conductive wiring layer, having at least one conductive pillar;
• and
• a second conductive pillar layer, disposed inside the dielectric material layer and between the metal core layer and the second conductive wiring layer, having at least one conductive pillar,
• wherein the at least one metal part has a first side and a second side opposite the first side, the first side is electrically connected to the at least one conductive pillar of the first conductive pillar layer, the second side is electrically connected to the at least one conductive pillar of the second conductive pillar layer, and a width of the first side is different from a width of the second side.