Substrate processing apparatus and substrate processing method

A substrate processing apparatus comprising:

• a rotating holder that rotates a substrate while holding the substrate horizontally;
• a first nozzle that is used to mix a processing solution and pressurized gas to generate a jet flow of droplets of said processing solution, and to eject said jet flow of droplets onto an upper surface of said substrate in an approximately vertical direction;
• a second nozzle that is used to discharge a continuous flow of said processing solution onto the upper surface of said substrate;
• and
• a nozzle moving unit that integrally moves said first nozzle and said second nozzle above said substrate while maintaining a positional relationship between said first nozzle and said second nozzle, wherein
• said nozzle moving unit moves said first nozzle and said second nozzle along respective arcuate paths, and moves said first nozzle so that a landing position, on said substrate, of said jet flow of droplets passes through a rotation center of said substrate, the arcuate paths having a common rotation axis and different lengths in a radial direction,
• movement paths of the landing position of said jet flow of droplets and the landing position of said continuous flow on a rotation track of said substrate are different from each other, and
• when said first nozzle is located above the peripheral portion of said substrate, a landing position, on said substrate, of said continuous flow is located closer to the rotation center of said substrate than the landing position of said jet flow of droplets and is also located downstream of the movement path of the landing position of said jet flow of droplets in a rotation direction of said substrate.