Inspection of regions of interest using an electron beam system
AssigneeApplied Materials Israel Ltd.
InventorsBenzion Sender, Alon Litman
Life of this patent
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Abstract
A system for scanning a plurality of regions of interest of a substrate using one or more charged particle beams, the system comprises: an irradiation module having charged particle optics; a stage for introducing a relative movement between the substrate and the charged particle optics; an imaging module for collecting electrons emanating from the substrate in response to a scanning of the regions of interest by the one or more charged particle beams; and wherein the charged particle optics is arranged to perform countermovements of the charged particle beam during the scanning of the regions of interest thereby countering relative movements introduced between the substrate and the charged particle optics during the scanning of the regions of interest.
Claims20
A system for scanning a plurality of regions of interest of a substrate using one or more charged particle beams, the system comprising:
- an irradiation module having charged particle optics;
- a stage for introducing a relative movement between the substrate and the charged particle optics;
- an imaging module for collecting electrons emanating from the substrate in response to multiple scans of a same region of interest by the one or more charged particle beams, wherein at least two scans of the multiple scans differ from each other by at least one image acquisition condition;
- and
- wherein the charged particle optics is arranged to perform countermovements of the charged particle beam during the scanning of the regions of interest thereby countering the relative movement introduced between the substrate and the charged particle optics during the scanning of the regions of interest, and wherein image acquisition occurs during introduction of the relative movement.
A method for scanning a plurality of regions of interest of a substrate, the method comprising:
- introducing a relative movement between the substrate and charged particle optics;
- during the introducing of the relative movement, scanning the regions of interest by the one or more charged particle beams;
- wherein the scanning comprises performing countermovements of the charged particle beam during the scanning of the regions of interest thereby countering the relative movement introduced between the substrate and the charged particle optics;
- and
- collecting electrons emanating from the substrate in response to multiple scans of a same region of interest by the one or more charged particle beams, wherein at least two scans of the multiple scans differ from each other by at least one image acquisition condition, and wherein image acquisition occurs during introduction of the relative movement.
A system for scanning a plurality of regions of interest of a substrate using one or more charged particle beams, the system comprising:
- an irradiation module having charged particle optics;
- a stage for introducing a relative movement between the substrate and the charged particle optics;
- an imaging module for collecting electrons emanating from the substrate in response to a scanning of the regions of interest by the one or more charged particle beams;
- and
- wherein the charged particle optics is arranged to perform countermovements of the charged particle beam during the scanning of the regions of interest thereby countering the relative movement introduced between the substrate and the charged particle optics during the scanning of the regions of interest, wherein at least two of the regions of interest differ from each other by at least one of shape or size, and wherein image acquisition occurs during introduction of the relative movement.
Dependencies are inferred from the claim text.