Multi charged particle beam writing method, and multi charged particle beam writing apparatus

A multi charged particle beam writing apparatus comprising:

• a stage configured to mount a target object thereon and to be continuously movable;
• an emission unit configured to emit a charged particle beam;
• an aperture member, in which a plurality of openings are formed, configured to form multiple beams by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings;
• a blanking plate in which there are arranged a plurality of blankers configured to respectively perform blanking deflection for a corresponding beam of the multiple beams having passed through the plurality of openings of the aperture member;
• a blanking aperture member configured to block each beam having been deflected to be in an “off” state by at least one of the plurality of blankers;
• a first deflector configured to collectively deflect each beam in an “on” state having passed through the blanking aperture member to a writing position of the each beam;
• a second deflector configured to collectively deflect the each beam in the “on” state having passed through the blanking aperture member in such a way as to follow a movement of the stage;
• and
• a deflection control unit configured to control the first deflector to deflect the each beam in the “on” state to a corresponding writing position, and after a writing time has passed, to deflect the each beam in the “on” state to be shifted to a next corresponding writing position, and to control the second deflector to continue tracking to follow the movement of the stage with respect to the each beam in the “on” state while the each beam irradiates the writing position and while the each beam irradiates the writing position which has been shifted at least once, and after the each beam irradiates the writing position which has been shifted at least once, to return a tracking position in an opposite direction from the movement of the stage by resetting the beam deflection for the tracking control,
• wherein writing of a predetermined region is completed by repeating, a number of times having been set in advance, a group of performing
• the emitting the each corresponding beam to the writing position of the each beam during from the starting the tracking control to the resetting the tracking control, and
• the emitting the each corresponding beam to the next writing position having been shifted at least once, and
• the deflection control unit controls the first deflector so that a distance at which the each beam in the “on” state is moved by collectively deflecting the each beam in the “on” state for the tracking control, from the starting the tracking control to the resetting the tracking control, in at least one of the group of performing is longer than that of other groups of performing to have a surplus time in the at least one of the group of performing in order to use a time for a complementary exposure.

A multi charged particle beam writing apparatus comprising:

• a stage configured to mount a target object thereon and to be continuously movable;
• an emission unit configured to emit a charged particle beam;
• an aperture member, in which a plurality of openings are formed, configured to form multiple beams by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings;
• a blanking plate in which there are arranged a plurality of blankers configured to respectively perform blanking deflection for a corresponding beam of the multiple beams having passed through the plurality of openings of the aperture member;
• a blanking aperture member configured to block each beam having been deflected to be in an “off” state by at least one of the plurality of blankers;
• a deflector configured to collectively deflect the each beam in an “on” state having passed through the blanking aperture member to a writing position of the each beam, and collectively deflect the each beam in the “on” state in such a way as to follow a movement of the stage;
• and
• a deflection control unit configured to control the deflector to deflect the each beam in the “on” state to a corresponding writing position, and after a writing time has passed, to deflect the each beam in the “on” state to be shifted to a next corresponding writing position, and to control the deflector to continue tracking of the each beam in the “on” state while the each beam irradiates the writing position and while the each beam irradiates the writing position which has been shifted at least once, and after the each beam irradiates the writing position which has been shifted at least once, to return a tracking position in an opposite direction of the movement of the stage, by resetting the beam deflection for the tracking control,
• wherein writing of a predetermined region is completed by repeating, a number of times having been set in advance, a group of performing
• the emitting the each corresponding beam in the “on” state to the writing position of the each beam in the “on” state during from the starting the tracking control to the resetting the tracking control, and
• the emitting the each corresponding beam in the “on” state to the next writing position having been shifted at least once, and
• the deflection control unit controls the deflector so that a distance at which the each beam in the “on” state is moved by collectively deflecting the each beam in the “on” state for the tracking control, from the starting the tracking control to the resetting the tracking control, in at least one of the group of performing is longer than that of other groups of performing to have a surplus time in the at least one of the group of performing in order to use a time for a complementary exposure.