Interferometer system, lithography apparatus, and article manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsZenichi Hamaya, Ryo Takai, Shinichiro Hirai, Takeshi Rokukawa, Takashi Miura
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Abstract
Provided is an interferometer system that irradiates an object to be measured with measuring light to thereby measure the position of the object to be measured. The interferometer system includes a laser light source; an interferometer configured to separate laser light emitted from an emission opening of the laser light source into the measuring light and reference light; and an optical path protecting member configured to surround an optical axis such that the laser light passes through the inside thereof and of which one opening is in contact with the emission opening.
Claims14
An interferometer system that irradiates an object to be measured with measuring light to thereby measure a position of the object to be measured, the interferometer system comprising:
- a laser light source including an emission opening from which laser light is emitted;
- a member including a first opening through which the laser light emitted from the emission opening enters, and configured to surround an optical path of the laser light;
- a light source cover configured to surround the laser light source and only a part of the member;
- and
- an interferometer configured to separate the laser light which passes through the first opening into the measuring light and reference light and that is provided on an outside of the light source cover such that an optical path of the measuring light is external to the light source cover,
- wherein an emission portion included in the laser light source including the emission opening is brought into contact with a first portion included in the member including the first opening.
A lithography apparatus that forms a pattern on a substrate, the lithography apparatus comprising:
- a holder configured to hold an original or the substrate, and to be moved;
- and
- an interferometer system configured to irradiate the holder with measuring light to thereby measure a position of the holder,
- wherein the interferometer system comprises:
- a laser light source including an emission opening from which laser light is emitted;
- a member including a first opening through which the laser light emitted from the emission opening enters, and configured to surround an optical path of the laser light;
- a light source cover configured to surround the laser light source and only a part of the member;
- and
- an interferometer configured to separate the laser light which passes through the first opening into the measuring light and reference light and that is provided on an outside of the light source cover such that an optical path of the measuring light is external to the light source cover,
- wherein an emission portion included in the laser light source including the emission opening is brought into contact with a first portion included in the member including the first opening.
A method of manufacturing an article, the method including:
- forming a pattern on a substrate using a lithography apparatus;
- and
- processing the substrate, on which the pattern has been formed, to manufacture the article,
- wherein the lithography apparatus comprises:
- a holder configured to hold an original or the substrate, and to be moved;
- and
- an interferometer system configured to irradiate the holder with measuring light to thereby measure a position of the holder,
- wherein the interferometer system comprises:
- a laser light source including an emission opening from which laser light is emitted;
- a member including a first opening through which the laser light emitted from the emission opening enters, and configured to surround an optical path of the laser light;
- a light source cover configured to surround the laser light source and only a part of the member;
- and
- an interferometer configured to separate the laser light which passes through the first opening into the measuring light and reference light and that is provided on an outside of the light source cover such that an optical path of the measuring light is external to the light source cover,
- wherein an emission portion included in the laser light source including the emission opening is brought into contact with a first portion included in the member including the first opening.
Dependencies are inferred from the claim text.