Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsTimotheus Franciscus Sengers, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard
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Abstract
In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.
Claims20
A lithographic projection apparatus comprising:
- a projection system configured to project a beam of radiation from a patterning device onto a substrate;
- a liquid supply system configured to provide a liquid to a space between the projection system and an object facing the projection system;
- and
- a movable table comprising:
- a sensor system component configured to be exposed to electromagnetic radiation, the sensor system component located or locatable below the projection system and the sensor system comprising an essentially opaque surface comprising an aperture through which the electromagnetic radiation passes to a surface located below the aperture and above which the liquid from the liquid supply system is to be provided, and
- a liquid impermeable layer spanning at least the aperture through which the electromagnetic radiation passes to the surface below the liquid impermeable layer, the liquid impermeable layer preventing the surface from contact with liquid contacting the liquid impermeable layer.
A device manufacturing method, comprising:
- projecting a beam of radiation onto a radiation-sensitive substrate through liquid in a space between a projection system of a lithographic apparatus and the substrate;
- providing a liquid between the projection system and a sensor system component in or on a movable table located below the projection system, the sensor system component comprising an essentially opaque surface comprising an aperture through which electromagnetic radiation can pass to a surface located below the aperture and above which the liquid from the liquid supply system is provided, and a liquid impermeable layer spanning at least the aperture;
- and
- passing electromagnetic radiation through the liquid impermeable layer to the surface below the liquid impermeable layer, the liquid impermeable layer preventing the surface from contact with liquid contacting the liquid impermeable layer.
A lithographic projection apparatus comprising:
- a projection system configured to project a beam of radiation from a patterning device onto a substrate;
- a liquid supply system configured to provide a liquid to a space between the projection system and an object facing the projection system;
- and
- a movable table comprising:
- a sensor system component configured to be exposed to electromagnetic radiation, the sensor system component located or locatable below the projection system and comprising a grating structure above which the liquid from the liquid supply system is to be provided, and
- a liquid impermeable layer through which the electromagnetic radiation passes to the grating structure below the liquid impermeable layer, the liquid impermeable layer at least in part preventing at least part of the grating structure from contact with liquid on the liquid impermeable layer.
Dependencies are inferred from the claim text.