Stage apparatus, lithography apparatus, and article manufacturing method

A stage apparatus comprising:

• a first movable unit;
• a linear motor that includes a stator coil array arranged over a stroke range in a predetermined direction of the first movable unit and a mover magnet fixed to the first movable unit, the mover magnet opposing the stator coil array;
• a second movable unit that is arranged to face the first movable unit via a space and relatively moves with respect to the first movable unit in the predetermined direction;
• and
• a switch unit configured to form a first closed circuit and a second closed circuit to generate a braking force for the first movable unit during operation of a dynamic brake, the first closed circuit including a first coil located in a center region of the stator coil array, the second closed circuit including a second coil located in a region, which is other than the center region, of the stator coil array,
• wherein an electrical resistance value of the second coil is less than an electrical resistance value of the first coil, and
• wherein the mover magnet opposes the second coil after the first movable unit and the second movable unit are in contact during operation of the dynamic brake.

A lithography apparatus which forms a pattern on a substrate, the apparatus comprising:

• a stage apparatus configured to move the substrate,
• wherein the stage apparatus including:
• a first movable unit;
• a linear motor that includes a stator coil array arranged over a stroke range in a predetermined direction of the first movable unit and a mover magnet fixed to the first movable unit, the mover magnet opposing the stator coil array;
• a second movable unit that is arranged to face the first movable unit via a space and relatively moves with respect to the first movable unit in the predetermined direction;
• and
• a switch unit configured to form a first closed circuit and a second closed circuit to generate a braking force for the first movable unit during operation of a dynamic brake, the first closed circuit including a first coil located in a center region of the stator coil array and a first resistance connected to the first coil, the second closed circuit including a second coil located in a region, which is other than the center region, of the stator coil array and a second resistance connected to the second coil,
• wherein an electrical resistance value of the second resistance is less than an electrical resistance value of the first resistance, and
• wherein the mover magnet opposes the second coil after the first movable unit and the second movable unit are in contact during operation of the dynamic brake.

A lithography apparatus which forms a pattern on a substrate, the apparatus comprising:

• a stage apparatus configured to move the substrate,
• wherein the stage apparatus including:
• a first movable unit;
• a linear motor that includes a stator coil array arranged over a stroke range in a predetermined direction of the first movable unit and a mover magnet fixed to the first movable unit, the mover magnet opposing the stator coil array;
• a second movable unit that is arranged to face the first movable unit via a space and relatively moves with respect to the first movable unit in the predetermined direction;
• and
• a switch unit configured to form a first closed circuit and a second closed circuit to generate a braking force for the first movable unit during operation of a dynamic brake, the first closed circuit including a first coil located in a center region of the stator coil array, the second closed circuit including a second coil located in a region, which is other than the center region, of the stator coil array,
• wherein an electrical resistance value of the second coil is less than an electrical resistance value of the first coil, and
• wherein the mover magnet opposes the second coil after the first movable unit and the second movable unit are in contact during operation of the dynamic brake.

A method of manufacturing an article, the method comprising steps of:

• forming a pattern on a substrate using a lithography apparatus;
• and
• processing the substrate on which the pattern has been formed to manufacture the article,
• wherein the lithography apparatus including:
• a stage apparatus configured to move the substrate,
• wherein the stage apparatus including:
• a first movable unit;
• a linear motor that includes a stator coil array arranged over a stroke range in a predetermined direction of the first movable unit and a mover magnet fixed to the first movable unit, the mover magnet opposing the stator coil array;
• a second movable unit that is arranged to face the first movable unit via a space and relatively moves with respect to the first movable unit in the predetermined direction;
• and
• a switch unit configured to form a first closed circuit and a second closed circuit to generate a braking force for the first movable unit during operation of a dynamic brake, the first closed circuit including a first coil located in a center region of the stator coil array and a first resistance connected to the first coil, the second closed circuit including a second coil located in a region, which is other than the center region, of the stator coil array and a second resistance connected to the second coil,
• wherein an electrical resistance value of the second resistance is less than an electrical resistance value of the first resistance, and
• wherein the mover magnet opposes the second coil after the first movable unit and the second movable unit are in contact during operation of the dynamic brake.

A method of manufacturing an article, the method comprising steps of:

• forming a pattern on a substrate using a lithography apparatus;
• and
• processing the substrate on which the pattern has been formed to manufacture the article
• wherein the lithography apparatus including:
• a stage apparatus configured to move the substrate,
• wherein the stage apparatus including:
• a first movable unit;
• a linear motor that includes a stator coil array arranged over a stroke range in a predetermined direction of the first movable unit and a mover magnet fixed to the first movable unit, the mover magnet opposing the stator coil array;
• a second movable unit that is arranged to face the first movable unit via a space and relatively moves with respect to the first movable unit in the predetermined direction;
• and
• a switch unit configured to form a first closed circuit and a second closed circuit to generate a braking force for the first movable unit during operation of a dynamic brake, the first closed circuit including a first coil located in a center region of the stator coil array, the second closed circuit including a second coil located in a region, which is other than the center region, of the stator coil array,
• wherein an electrical resistance value of the second coil is less than an electrical resistance value of the first coil, and
• wherein the mover magnet opposes the second coil after the first movable unit and the second movable unit are in contact during operation of the dynamic brake.