Illumination device and method for using the same in the projection lithography machine

An illumination device for a projection lithographic machine, comprising

• a laser source,
• a beam expander,
• a micromirror array,
• a fast steering mirror,
• a diaphragm array,
• a microlens array,
• an illumination lens group, and
• a reflection mirror,
• wherein the micromirror array has a first control system and micromirrors;
• the first control system comprises a first computer and a micromirror array controller;
• the first computer controls a rotating angle of the micromirrors on the micromirror array through the micromirror array controller;
• the fast steering mirror has a second control system;
• the second control system comprises a second computer and a fast steering mirror controller;
• the second computer controls a rotatable mirror of the fast steering mirror through the fast steering mirror controller;
• the diaphragm array is located in a front focal plane of the microlens array, the diaphragm array is in rectangular shape and comprises a plurality of identical small rectangular diaphragms;
• all the small rectangular diaphragms are arranged in two-dimension uniform distribution, all long axes of the small rectangular diaphragms are parallel to each other, the length of the small diaphragm is less than a space between the two adjacent small diaphragms along a direction of the length of the small diaphragms;
• the width of the small diaphragm width is less than a space between the two adjacent small diaphragms along a direction of the width of the small diaphragms;
• and
• all the micromirrors on the micromirror array are in the same shape.