Composition for forming topcoat layer and resist pattern formation method employing the same

A composition for forming a topcoat layer, the composition comprising:

• a nonionic surfactant;
• a graphene derivative including a hydrophilic group;
• a solvent;
• and
• a binder including a deep-ultraviolet absorbing group, wherein:
• the graphene derivative is present in an amount of about 0.5 to about 10 wt % based on a total weight of the composition,
• the binder is present in an amount about 0.01 to about 10 wt % based on a total weight of the composition, and
• an oxygen content of the graphene derivative is equal to or greater than about 1 wt % and equal to or less than about 10 wt % based on a total weight of the graphene derivative.

A pattern formation method, comprising:

• disposing a resist composition on a substrate, to form a resist layer;
• coating the resist layer with a topcoat composition for forming a topcoat layer, the topcoat composition including:
• a graphene derivative including a hydrophilic group;
• and
• a solvent;
• heating the topcoat composition to harden the topcoat composition;
• subjecting the resist layer to exposure using extreme ultraviolet light;
• and
• developing exposed resist layer with an alkali aqueous solution.