Array substrate and method for preparing the same, liquid crystal panel

A method of preparing an array substrate, comprising:

• S10:
• preparing a gate electrode on a glass substrate;
• S20:
• sequentially forming a gate insulating layer thin film, an active layer, an ohmic contact layer, a source electrode and a drain electrode on the glass substrate after the step S10, wherein the gate insulating layer thin film covers a light transmitting region and a light non-transmitting region of a pixel structure,
• coating a photoresist on the source/drain metal thin film, exposing and developing the photoresist with a double-tone mask, and retaining the photoresist corresponding to a source region and a drain region, and the photoresist corresponding to a channel region, etching away the exposed region of the source/drain metal thin film, the ohmic contact layer thin film and the active layer thin film, removing the photoresist corresponding to the channel region through ashing process, and etching the ohmic contact layer thin film and the source/drain metal thin film on the channel region, and removing the residual photoresist to obtain the gate insulating layer thin film, the active layer, the ohmic contact layer and the source/drain electrodes;
• S30:
• preparing a passivation layer thin film on the glass substrate after step S20, wherein the passivation layer thin film covers the light transmitting region and the light non-transmitting region of the pixel structure;
• S40:
• preparing a via hole on the passivation layer thin film by etching process, and etching the gate insulating layer thin film and the passivation layer thin film covered on the light transmitting region, such that the light transmitting region exposes the glass substrate;
• and
• S50:
• preparing a pixel electrode on the glass substrate after step S40, wherein the pixel electrode in the light transmitting region is directly formed on the glass substrate, and the pixel electrode is electrically connected to the source electrode or the drain electrode through the via hole.

A liquid crystal panel, comprising:

• an array substrate and a color filter substrate disposed opposite to each other, and a liquid crystal layer disposed between the array substrate and the color filter substrate, wherein the array substrate comprises a glass substrate and a plurality of pixel structures formed on the glass substrate, each pixel structure includes a light transmitting region comprising a gate electrode, a gate insulating layer, an active layer, a source electrode, a drain electrode and a passivation layer which are sequentially formed on the glass substrate and a light transmitting region including a pixel electrode formed directly on the glass substrate, and extending to the light non-transmitting region to electrically connect to the source electrode or the drain electrode, wherein the gate insulating layer, the active layer, and the source and drain electrodes are sequentially formed on both the light transmitting and non-transmitting regions of the glass substrate following a preparation of the gate electrode, such that the gate insulating layer thin film covers the light transmitting and non-transmitting regions, wherein the source/drain metal thin film is coated with a photoresist subsequently exposed and developed with a double-tone mask to retain the photoresist corresponding to a source region, a drain region, and a channel region, wherein the exposed region of the source/drain metal thin film, the ohmic contact layer thin film, and the active layer thin film are subsequently etched away and the photoresist corresponding to the channel region is removed through the ashing process, and wherein the ohmic contact layer thin film and the source/drain metal thin film on the channel region are subsequently etched and the residual photoresist is removed to obtain the gate insulating layer thin film, the active layer, the ohmic contact layer and the source/drain electrodes.