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US 9,804,094 B2Granted
Plasma spectrometer
AssigneeHitachi High-Technologies Corporation
InventorsYoshinobu Kohara, Yuzuru Takamura
Life of this patent
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Abstract
To improve the detection sensitivity, detection accuracy, and reproducibility when electrostatic discharge is generated in a sample solution and analysis is performed using light emission in the generated plasma. A flow channel 100, which has cylindrical main portions each expanding conically from a narrow portion, is filled with a conductive sample solution, and an electric field is applied to the flow channel 100 to generate plasma in the generated air bubbles, so that the resulting light emission is measured.
Claims13
A plasma spectrometer comprising:
- a flow channel supplied with a sample solution, the flow channel including a narrow portion, main portions each having a larger flow channel cross-section than a flow channel cross-section of the narrow portion, and connection portions each connecting the narrow portion and one of the main portions;
- a pair of electrodes arranged so as to interpose the main portions therebetween, the pair of electrodes being configured to apply a voltage to the flow channel;
- and
- a detector to measure plasma emission generated in air bubbles that are generated in the sample solution in the flow channel upon application of the voltage,
- wherein each of the connection portions is substantially conical in shape, and each of the main portions is substantially cylindrical in shape, and
- wherein the electrodes are arranged to extend along a central axis of the narrow portion.
3 more elements
Dependencies are inferred from the claim text.