Observation and photography apparatus
AssigneesKagoshima University, National University Corporation, Nakayamadenki Co., Ltd.
InventorsYoshitaka Adachi, Makoto Nakayama
Life of this patent
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Abstract
An observation and photography apparatus that has a polishing mechanism attached thereto. The polishing mechanism is provided with a turntable with a perpendicular rotation shaft, a polishing cloth for polishing the surface of a sample attached to the bottom surface of the turntable, and a polishing-fluid spraying nozzle disposed below the polishing cloth for spraying polishing fluid containing polishing material upward to we the polishing cloth.
Claims6
An observation and photography device in which an electrolytic polishing mechanism is attached to a photography unit-equipped microscope capable of observing and photographing a surface of a sample, the electrolytic polishing mechanism repeatedly electrolytically polishing the surface of the sample in equidistant intervals or by an established amount in a vertical direction prior to observation, wherein the electrolytic polishing mechanism comprises:
- a turntable having a vertical rotation shaft;
- an electrolyte-absorbing cloth for absorbing electrolyte for electrolytically polishing an observation plane, the electrolyte-absorbing cloth being attached to a lower surface of the turntable;
- and an electrolyte-spraying nozzle for spraying the electrolyte upward to wet the electrolyte-absorbing cloth, the electrolyte-spraying nozzle being disposed below the electrolyte-absorbing cloth, wherein the turntable is disposed inside a cylindrical cover, the photography unit-equipped microscope is disposed outside the cylindrical cover, and a spray area of the polishing-liquid spray nozzle or the electrolyte spray nozzle is set inside the cylindrical cover.
Dependencies are inferred from the claim text.