Method and apparatus for depositing atomic layers on a substrate
AssigneeNederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
InventorsAdrianus Johannes Petrus Maria Vermeer, Freddy Roozeboom, Joop Van Deelen
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Abstract
Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum.
Claims19
A method for depositing a plurality of atomic layers on a substrate, the method comprising:
- supplying a precursor gas from an output face of a deposition head towards the substrate, the output face having a substantially rounded shape at least partly defining a movement path of the substrate;
- rotating the deposition head, with a rotational frequency controlled by a driving controller, while supplying the precursor gas;
- and
- moving the substrate along the movement path with a translational velocity controlled by a transportation controller to deposit the plurality of atomic layers while continuously rotating the deposition head in one direction of rotation,
- wherein the driving controller and transportation controller impart, in conjunction, different rates and/or directions of movement between the deposition head and substrate.
Dependencies are inferred from the claim text.