Methods for fabricating a chemical-mechanical polishing composition
AssigneeCabot Microelectronics Corporation
InventorsSteven Grumbine, Jeffrey Dysard, Ernest Shen, Mary Cavanaugh, Daniel Clingerman
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Abstract
Methods for fabricating a chemical-mechanical polishing composition include growing colloidal silica abrasive particles in a liquid including an aminosilane compound such that the aminosilane compound becomes incorporated in the abrasive particles. A dispersion including such colloidal silica abrasive particles may be further processed to obtain a chemical-mechanical polishing composition including colloidal silica particles having the aminosilane compound incorporated therein.
Claims20
A method for manufacturing a chemical mechanical polishing composition, the method comprising:
- (a) providing a liquid solution;
- (b) adding a silica producing compound and an aminosilane compound into the liquid solution, thereby causing colloidal silica particles to grow such that a dispersion is obtained including colloidal silica particles having the aminosilane compound incorporated therein;
- and
- (c) processing the dispersion to obtain a chemical mechanical polishing composition including colloidal silica particles having the aminosilane compound incorporated therein, the processing including adjusting a pH of the dispersion to a value in a range from about 1.5 to about 7 and diluting the dispersion such that the colloidal silica particles make up less than 20 percent by weight of the polishing composition.
A method for manufacturing a chemical mechanical polishing composition, the method comprising the following processing steps in sequence:
- (a) providing a dispersion including colloidal silica abrasive particles dispersed in a liquid carrier;
- (b) admixing an aminosilane compound to the dispersion such that the aminosilane associates with the colloidal silica particles;
- (c) adding a silica producing compound to the dispersion thereby causing further growth of the colloidal silica abrasive particles such that the aminosilane compound becomes incorporated in the particles to obtain a modified dispersion;
- and
- (d) processing the modified dispersion to obtain the chemical mechanical polishing composition.
Dependencies are inferred from the claim text.