Apparatus for producing silicon nanoparticle using inductive coupled plasma

An apparatus for producing silicon nanoparticles, comprising:

• a plasma reactor including a gas supply part in which a plurality of first gas pipes for introducing a first gas into the plasma reactor therethrough and a plurality of second gas pipes for introducing a second gas into the plasma reactor therethrough are arranged in an alternative pattern, wherein the first gas supply pipes are extended from an inlet of the reactor to a plasma initiation region within the plasma reactor and the second gas supply pipes are not extended to the plasma initiation region, and a plasma reaction part having an ICP coil wound around an outer wall thereof in which the silicon particles are formed as the gases introduced through the respective pipes are subjected to a plasma reaction;
• and
• a collection part for collecting the silicon particles,
• wherein the plurality of first gas pipes and the plurality of second gas pipes are arranged in an alternative pattern, the plurality of second gas pipes are displaced in parallel with the plurality of first gas pipes, the plurality of second gas pipes are shorter than the plurality of first gas pipes so that a plasma reaction between the first and the second gas occurs uniformly at a high density.