UV light emitting devices and systems and methods for production

A method of fabricating an ultraviolet (UV) light emitting device comprising:

• receiving a UV transmissive substrate;
• forming a UV transmissive layer upon the UV transmissive substrate, comprising:
• forming a first UV transmissive layer comprising aluminum nitride upon the UV transmissive substrate using a first deposition technique at a temperature less than about 800 degrees Celsius or greater than about 1200 degrees Celsius;
• and
• forming a second UV transmissive layer comprising aluminum nitride upon the first UV transmissive layer comprising aluminum nitride using a second deposition technique that is different from the first deposition technique, at a temperature within a range of about 800 degrees Celsius to about 1200 degrees Celsius;
• and
• forming a UV light emitting layer structure on the UV transmissive layer, comprising:
• forming an n-type layer comprising aluminum gallium nitride layer upon the UV transmissive layer;
• forming one or more quantum well structures comprising aluminum gallium nitride upon the n-type layer;
• and
• forming a p-type nitride layer upon the one or more quantum well structures.