US 9,793,366 B2 · Array substrate, method of fabricating the same, display panel and display device

Abstract

An array substrate, a method for fabricating the same, a display panel and a display device are disclosed. The array substrate comprises a display area and a non-display area that is outside the display area. The method comprises: forming a metal layer on a base substrate, the metal layer comprising a conductive pattern in the display area and a first electrode in the non-display area; forming a protective layer on the metal layer, a thickness of the protection layer in the non-display area being less than a thickness of the protection layer in the display area; forming a display electrode layer on the protection layer and removing the display electrode layer in the non-display area; and removing the protection layer in the non-display area.

Claims12

Dependent claims

A method for fabricating an array substrate, the array substrate comprising a display area and a non-display area that is outside the display area, wherein the method comprises:

forming a metal layer on a base substrate, the metal layer comprising a conductive pattern in the display area and a first electrode in the non-display area;
forming a protective layer on the metal layer, a thickness of the protection layer in the non-display area being less than a thickness of the protection layer in the display area;
forming a display electrode layer on the protection layer and removing the display electrode layer only in the non-display area;
and
removing the protection layer in the non-display area.

2 more elements

Dependencies are inferred from the claim text.

Facts

Application

15/131,175Filed 18 Apr 2016

Priority

CN 2015 1 026307021 May 2015

Published

US 2016/0343736 A124 Nov 2016

Granted

17 Oct 2017

Term ends

Not estimatedThe source records don’t support an estimate.

Classification19 codes

H10D 30/6737
Characterised by the electrodes: characterised by the electrode materials
H10D 30/0316
Characterised by the gate electrodes: of lateral bottom-gate TFTs comprising only a single gate
H10D 30/0321
Of thin-film transistors [TFT]: comprising silicon, e.g. amorphous silicon or polysilicon
H10D 30/6732
Characterised by the shapes, relative sizes or dispositions of the gate electrodes: bottom-gate only TFTs

Array substrate, method of fabricating the same, display panel and display device

Life of this patent

Array substrate, method of fabricating the same, display panel and display device

Life of this patent

Abstract

Claims12