Array substrate, method for producing the same and display apparatus

A method for producing an array substrate, the array substrate comprising display areas and non-display areas, the method comprising:

• forming metal film layers and patterning the metal film layers to form a plurality rows of gate lines and a plurality columns of data lines crossed to each other in the non-display area and forming thin film transistors,
• wherein the method further comprises:
• forming a pad part at one end of the gate lines or data lines;
• wherein the process of producing the pad part comprises:
• forming a first insulation layer on the metal film layers by patterning;
• forming an etching protection layer, a source and drain metal layer and a second insulation layer sequentially by patterning,
• wherein the first insulation layer, the etching protection layer, the source and drain metal layer and the second insulation layer form a trapezoid stack;
• wherein the method further comprises:
• magnetron sputtering targets spaced to each other to form metal film layers;
• and
• forming the pad part in an area of the non-display areas where spacing areas between the targets are located, and a sum of thickness of the metal film layers formed in the areas where the spacing areas between the targets are located and the thickness of the pad part is equal to the thickness of the metal film layer formed in the areas facing the targets.