Compositions and methods for semiconductor processing and devices formed therefrom
OwnerArjun Mendirattainventor
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Abstract
The present invention relates generally to the field of semiconductor devices, including solar cells, and compositions and methods for processing semiconductor devices, passivation of semiconductor surfaces, semiconductor etching and anti-reflective coatings for semiconductor devices.
Claims15
A method of growing an oxide layer on a semiconductor device, the method comprising the step of contacting at least one surface of a semiconductor device with the dilute aqueous solution comprising:
- (a) an oxidant, wherein the oxidant is H2SeO3;
- (b) a compound comprising fluorine;
- (c) one or more additives;
- and
- (d) water.
A method of growing an oxide layer on a semiconductor device, the method comprising the step of contacting at least one surface of a semiconductor device with the dilute aqueous solution comprising:
- (a) an oxidant;
- (b) a compound comprising fluorine;
- (c) one or more additives;
- and
- (d) water,
- wherein the oxidant comprises one or more of fluorine, chlorine, or bromine.
Dependencies are inferred from the claim text.