Loading patent…
AssigneeJX Nippon Mining & Metals Corporation
InventorsShin-ichi Ogino, Yuichiro Nakamura
Estimating the term…
Provided is an oxide-containing magnetic material sputtering target wherein the oxides have an average grain diameter of 400 nm or less. Also provided is a method of producing an oxide-containing magnetic material sputtering target. The method involves depositing a magnetic material on a substrate by the PVD or CVD method, then removing the substrate from the deposited magnetic material, pulverizing the material to obtain a raw material for the target, and further sintering the raw material. An object of the present invention is to provide a magnetic material target, in particular a nonmagnetic grain-dispersed ferromagnetic sputtering target capable of suppressing discharge abnormalities of oxides that are the cause of particle generation during sputtering.
A ferromagnetic sintered alloy sputtering target having a sintered structure containing a dispersion of grains of nonmagnetic oxides, wherein the grains of nonmagnetic oxides have an average diameter of 400 nm or less and a shape characterized in an aspect ratio of 2 or less.
The ferromagnetic sintered alloy sputtering target according to 1, wherein the nonmagnetic oxides are oxides of one or more elements selected from the group consisting of B, Si, Cr, Ti, Ta, W, Al, Mg, Mn, Ca, Zr, and Y in a total amount of 1 to 20 mol %.
A ferromagnetic sintered alloy sputtering target having a sintered structure containing a dispersion of grains of nonmagnetic oxides, wherein the sintered structure is a mixed structure comprising an alloy Phase A containing grains of nonmagnetic oxides which have an average diameter of 400 nm or less and a shape characterized in an aspect ratio of 2 or less, and an alloy Phase B surrounding the alloy Phase A and containing grains of nonmagnetic oxides which have an average diameter of 2μm or less.
Dependencies are inferred from the claim text.