Focused ion beam apparatus
AssigneeHitachi High-Tech Science Corporation
InventorsAnto Yasaka, Tomokazu Kozakai, Osamu Matsuda, Yasuhiko Sugiyama, Kazuo Aita, Fumio Aramaki, Hiroshi Oba
Life of this patent
Estimating the term…
Abstract
A focused ion beam apparatus is equipped with a gas field ion source that can produce a focused ion beam for a long period of time by stably and continuously emitting ions from the gas field ion source having high luminance, along an optical axis of an ion-optical system for a long period of time. The gas field ion source has an emitter for emitting ions, the emitter having a sharpened end part made of iridium fixed to a cylinder-shaped base part made of dissimilar wire.
Claims11
A focused ion beam apparatus at least equipped with a gas field ion source having an emitter for emitting ions, wherein the emitter has a shape in which a sharpened end part made of iridium is fixed to a cylinder shape base part made of dissimilar wire.
In a focused on beam apparatus:
- a gas field ion source having an emitter configured to emit ions, the emitter having a sharpened end part made of iridium fixed to a cylinder-shaped base part that is not made of iridium.
Dependencies are inferred from the claim text.