Semiconductor process management system, semiconductor manufacturing system including the same, and method of manufacturing semiconductor
AssigneeSamsung Electronics Co., Ltd.
InventorsDong-hoon Han, Jai-hyung Won, Do-hyung Kim, Sung-hyup Kim, Ho-jun Kim
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Abstract
A semiconductor process management system is provided. The semiconductor process management system includes a communicator that receives a process recipe from one or more process apparatuses and receives a measured value for each sampling point from one or more measuring apparatus, and a first determination unit that establishes a mutual influence model between the process recipe and the measured value for each sampling point based on the process recipe and the measured value for each sampling point.
Claims20
A semiconductor manufacturing system comprising:
- at least one process apparatus that is configured to receive a process recipe comprising a plurality of process factors, and perform at least one unit process;
- at least one measuring apparatus that is configured to measure a value of a specification of a wafer on which at least one unit process has been performed;
- and
- a process management system that is configured to manage one or more unit processes,
- wherein the process management system comprises:
- a communicator that is configured to receive the process recipe from the at least one process apparatus, and to receive a measured value of a specification of a wafer on which at least one unit process has been performed from the at least one measuring apparatus;
- and
- a first determination unit that is configured to establish a mutual influence model for relating effects of the plurality of process factors in the process recipe on the measured value, for use in determining if the wafer, on which at least one unit process has been performed, is defective.
A semiconductor process management system comprising:
- a communicator that is configured to receive a process recipe comprising a plurality of process factors from at least one process apparatus, and to receive a measured value of a specification of a wafer on which at least one unit process has been performed for each sampling point from at least one measuring apparatus;
- and
- a first determination unit that is configured to establish a mutual influence model for relating effects of the plurality of process factors in the process recipe on the measured value for each sampling point.
A semiconductor manufacturing system comprising:
- at least one process apparatus that is configured to receive a process recipe comprising a plurality of process factors and perform at least one unit process;
- at least one measuring apparatus that is configured to measure a value of a specification of a wafer on which the at least one unit process has been performed;
- a process management system that is configured to manage one unit processes;
- and
- a yield test apparatus that is configured to test whether the wafer is defective,
- wherein the process management system comprises:
- a communicator that is configured to receive the process recipe from the at least one process apparatus, receive a measured value from the at least one measuring apparatus, and receive a test result from the yield test apparatus;
- and
- a first determination unit that is configured to establish a mutual influence model for relating effects of the plurality of process factors in the process recipe on the test result and at least one selected from the process recipe and the measured value.
Dependencies are inferred from the claim text.