Assembly for a projection exposure apparatus for EUV projection lithography

An assembly, comprising:

• an illumination optical unit configured to guide illumination light to an illumination field, the illumination optical unit comprising:
• a first facet mirror comprising a plurality of mirror arrays arranged in an array superstructure, gaps extending along a main direction between neighboring mirror arrays, and each mirror array comprising a plurality of individual mirrors configured to provide individual mirror illumination channels to guide illumination light partial beams to the illumination field;
• and
• a second facet mirror downstream of the first facet mirror in a beam path of the illumination light through the illumination optical unit, the second facet mirror comprising a plurality of facets, each facet of the second facet mirror configured to contribute to imaging a group of the individual mirrors of the first facet mirror into the illumination field via a group mirror illumination channel, images of the individual mirrors of the first facet mirror complementing each other in the illumination field to form the whole illumination field;
• and
• a projection optical unit configured to image an object field into an image field,
• wherein:
• the object field is arranged in the illumination field;
• the projection optical unit comprises an object holder and a displacement drive;
• the object holder is configured to hold a lithography mask in the object field;
• the displacement drive is configured to displace the object holder along a displacement direction;
• a smallest angle between the main direction and the displacement direction is between 20° and 44°;
• and
• the assembly is an EUV projection exposure assembly.