Exposure apparatus
AssigneeGigaphoton Inc.
InventorsTakashi Onose, Kouji Kakizaki, Osamu Wakabayashi, Akiyoshi Suzuki
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Abstract
An exposure apparatus may include a laser light source capable of varying a wavelength of a laser beam that is emitted from the laser light source, a mask on which a pattern is formed, the pattern being configured to generate diffracted light by being irradiated with the laser beam, and a controller configured to control, in accordance with a distance between the mask and a substrate, the wavelength of the laser beam that is emitted from the laser light source, wherein the mask is irradiated with the laser beam emitted from the laser light source to perform proximity exposure on a surface of the substrate.
Claims17
An exposure apparatus configured to perform proximity exposure on a surface of a substrate, the exposure apparatus comprising:
- a laser light source capable of varying a wavelength of a laser beam that is emitted from the laser light source;
- a mask on which a pattern is formed, the pattern having a periodic structure and being configured to generate diffracted light by being irradiated with the laser beam, the mask being irradiated with the laser beam emitted from the laser light source;
- and
- a controller configured to control, in accordance with a distance between the mask and the substrate, the wavelength of the laser beam that is emitted from the laser light source, wherein
- the exposure is performed with light generated by interference caused by the Talbot effect;
- and
- the controller is configured to control the wavelength of the laser beam that is emitted from the laser light source so that the distance between the mask and the substrate is equal to an integer multiple of a Talbot distance under the Talbot effect.
An exposure apparatus configured to perform proximity exposure on a surface of a substrate, the exposure apparatus comprising:
- a laser light source capable of varying a wavelength of a laser beam that is emitted from the laser light source;
- a mask on which a pattern is formed, the pattern having a periodic structure and being configured to generate diffracted light by being irradiated with the laser beam, the mask being irradiated with the laser beam emitted from the laser light source;
- and
- a controller configured to control, in accordance with a distance between the mask and the substrate, the wavelength of the laser beam that is emitted from the laser light source, wherein
- the exposure is performed with light generated by interference caused by the Talbot effect;
- and
- the controller is configured to control a spectrum line width of the laser beam that is emitted from the laser light source so that a desired depth of focus is achieved.
Dependencies are inferred from the claim text.