Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device
AssigneeFUJIFILM Corporation
InventorsAkiyoshi Goto, Masafumi Kojima, Michihiro Shirakawa, Keita Kato, Keiyu Ou
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Abstract
The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a resin (P) including a repeating unit (i) having a group which decomposes by the action of an acid represented by the following General Formula (1), a pattern forming method using the composition, a method for manufacturing an electronic device, and an electronic device.
Claims12
An actinic ray-sensitive or radiation-sensitive resin composition comprising a resin (P) including a repeating unit (i) having a group which decomposes by the action of an acid represented by the following General Formula (1):
- in General Formula (1), R1 represents an alkyl group having 2 or more carbon atoms, R2 represents an alkyl group having 2 or more carbon atoms, and Z represents a group that forms a monocyclic structure together with a carbon atom.
Dependencies are inferred from the claim text.