Resist composition and method for producing resist pattern

A resist composition comprising

• (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, and having a structural unit represent by the formula (a1-1) or the formula (a1-2),
• (B) an acid generator represented by the formula (II), and
• (D) a compound represented by the formula (I),
• wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom;
• m and n independently represent an integer of 0 to 4;
• wherein R3 and R4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group;
• X1 represents an C1 to C17 divalent saturated hydrocarbon group, and one or more hydrogen atom contained in the divalent saturated hydrocarbon group may be replaced by a fluorine atom, one or more —CH2— contained in the divalent saturated hydrocarbon group may be replaced by —O— or —CO—;
• R5 represents a group having cyclic ether structure;
• Z1+ represents an organic cation;
• and
• which further comprises a solvent,
• in each formula, La1 and La2 independently represent *—O— or *—O—(CH2)k1—CO—O—, k1 represents an integer of 1 to 7, * represents a bond to the carbonyl group;
• Ra4 and Ra5 independently represent a hydrogen atom or a methyl group;
• Ra6 and Ra7 independently represent a C1 to C8 alkyl group or a C3 to C10 alicyclic hydrocarbon group;
• m1 represents an integer 0 to 14;
• n1 represents an integer 0 to 10;
• and
• n1′ represents an integer 0 to 3,
• wherein R5 in the formula (II) is a group represented by the formula (IIA) or the formula (IIE),
• wherein s1 is 1 or 2
• t1 represents an integer of 0 to 2,
• provided that s1+t1 is 2 to 3;
• s11 represents an integer of 1 to 4,
• t11 represents an integer of 0 to 2;
• s12 is 1 or 2,
• t12 represents an integer of 0 to 2,
• provided that s12+t12 is 2 to 3;
• R6 in each occurrence represents a C1 to C12 saturated hydrocarbon group, a C6 to C18 aromatic hydrocarbon group, or two R6 are bonded together to form a ring, and one or more hydrogen atoms contained in the saturated hydrocarbon group, the aromatic hydrocarbon group and the ring may be replaced by a C1 to C6 alkyl group or a nitro group, and one or more —CH2— contained in the saturated hydrocarbon group and ring may be replaced by —O—;
• u1 represents an integer of 0 to 8;
• R7 and R8 in each occurrence independently represent a hydroxy group, a halogen atom, a C1 to C6 alkyl group, a C1 to C6 alkoxyl group, a C1 to C6 hydroxy alkyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group or a C2 to C7 acylamino group, or two of R7 and/or R8 may be bonded together to form a single bond or a ring;
• u2 and u3 independently represent an integer of 0 to 16;
• and
• * represents a bond to X1.