Titanium-containing film forming compositions for vapor deposition of titanium-containing films
AssigneeL'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
InventorsChanghee Ko, Julien Gatineau, Clément Lansalot-Matras, Julien Lieffrig, Hana Ishii
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Abstract
Titanium-containing film forming compositions are disclosed as well as methods of synthesizing the same and methods of forming Titanium-containing films on substrates via vapor deposition processes using the Titanium-containing film forming compositions. The Titanium-containing film forming compositions comprise a precursor having the formula Ti(R5Cp)2(L), wherein each R is independently H, an alkyl group, or R′3Si, with each R′ independently being H or an alkyl group; L is selected from the group consisting of formamidinates (NR,R′-fmd) or amidinates (NR,R′R″-amd).
Claims20
A Titanium-containing film forming composition comprising a liquid precursor having the formula
- Ti(R5Cp)2(L)
- wherein Cp is cyclopentadienyl, each R is independently H, an alkyl group, or R′3Si, with each R′ independently being H or an alkyl group;
- and L is a formamidinate ligand having the chemical formula R—N—C(H)═N—R′, shown as:
- (NR′,R′-fmd or NR-fmd when R═R′) or am idinate ligand having the chemical formula R—N—C(R″)═N—R′, shown as:
- (NR′,R′R″-amd or NRR″-amd when R═R′), wherein R and R′ are alkyl groups or SiMe3 and R″ is an alkyl group.
A method of forming a Titanium-containing film, the method comprising introducing into a reactor having a substrate therein a vapor of a Titanium-containing film forming composition comprising a liquid precursor having the formula
- Ti(R5Cp)2(L)
- wherein Cp is cyclopentadienyl, each R is independently H, an alkyl group, or R′3Si, with each R′ independently being H or an alkyl group;
- and L is a formamidinate ligand having the chemical formula R—N—C(H)═N—R′, shown as:
- (NR,R′-fmd) or amidinate ligand having the chemical formula R—N—C(R″)═N—R′, shown as:
- (NR,R′, R″-amd), wherein R and R′ are alkyl groups or SiMe3 and R″ is an alkyl group, and
- depositing at least part of the Titanium-containing film forming composition onto the substrate.
Dependencies are inferred from the claim text.