Long lifetime thermal spray coating for etching or deposition chamber application
AssigneeLam Research Corporation
InventorsChin-Yi Liu, Russell Ormond, Nash W. Anderson, David M. Schaefer
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Abstract
In accordance with this disclosure, there are provided several inventions, including a substrate processing apparatus with multi-layer surfaces configured to face the plasma and resist against corrosion. These multi-layer surfaces may in one example include a base layer of aluminum, anodized aluminum, or quartz, a second layer of stabilized zirconia, and a second layer of a yttrium-aluminum composite such as yttrium aluminum garnet (YAG).
Claims16
A substrate processing apparatus comprising a chamber configured to contain a plasma, wherein the apparatus comprises one or more multi-layer surfaces oriented to face the plasma, the one or more multi-layer surfaces each comprising:
- a base material;
- a first layer over the base material consisting essentially of zirconia stabilized with a dopant oxide;
- and
- a second layer over the first layer, comprising a yttrium-aluminum composite.
Dependencies are inferred from the claim text.