Abrasive particles, polishing slurry and method of fabricating abrasive particles
AssigneeUbmaterials Inc.
InventorJin Hyung Park
Life of this patent
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Abstract
The present disclosure relates to abrasive particles, a polishing slurry and a fabricating method of the abrasive particles. The fabricating method of abrasive particles in accordance with an exemplary embodiment of the present disclosure includes preparing a precursor solution in which a first precursor is mixed with a second precursor that is different from the first precursor, preparing a basic solution, mixing the basic solution with the precursor solution and forming a precipitate, and washing abrasive particles synthesized by precipitation.
Claims13
A method of fabricating abrasive particles, the method comprising:
- preparing a precursor solution in which a first precursor is mixed with a second precursor that is different from the first precursor;
- preparing a basic solution;
- mixing the basic solution with the precursor solution and forming a precipitate;
- and
- washing abrasive particles synthesized by precipitation;
- wherein said preparing a precursor solution comprises:
- mixing the first precursor with water to prepare a first precursor solution;
- mixing the second precursor with water to prepare a second precursor solution;
- adding an acidic material to the second precursor solution;
- and
- thereafter, mixing the first precursor solution with the second precursor solution;
- and
- wherein mixing the first precursor solution with the second precursor solution comprises adjusting a mixing ratio of the first precursor solution to the second precursor solution in a range of 1:1 to 1:5.
A method of fabricating abrasive particles, the method comprising:
- preparing a precursor solution in which a first precursor is mixed with a second precursor that is different from the first precursor;
- preparing a basic solution;
- mixing the basic solution with the precursor solution and forming a precipitate;
- and
- washing abrasive particles synthesized by precipitation;
- wherein said preparing a precursor solution comprises:
- mixing the first precursor with water to prepare a first precursor solution;
- mixing the second precursor with water to prepare a second precursor solution;
- adding an acidic material to the second precursor solution;
- and
- thereafter, mixing the first precursor solution with the second precursor solution;
- wherein the first precursor comprises an organic salt containing a cerium (III), and the second precursor comprises an inorganic salt containing the cerium (III);
- wherein the pH of the second precursor solution is adjusted to prevent the cerium (III) transforming into cerium (IV).
Dependencies are inferred from the claim text.