Organic-inorganic complex, and forming composition thereof

A method for producing an organic-inorganic complex having a segregation layer of polysiloxane formed on a surface layer of the organic-inorganic complex, the method comprising:

• heating to thermally-cure an organic-inorganic complex-forming composition, thereby forming the organic-inorganic complex having the segregation layer, the composition comprising:
• a) a first organic silicon compound represented by formula (I) and/or a condensate thereof:
• RnSiX4-n (I)
• wherein:
• R represents a hydrocarbon group having 1 to 30 carbon atoms, excluding an ethenyl group and a (meth)acryloxy group, wherein the hydrocarbon group is optionally substituted with a halogen atom and has a carbon atom directly bonded to Si,
• each X independently represents a hydroxyl group or a hydrolyzable group,
• n represents 1 or 2, and
• when n is 2, each R is the same or different;
• b) an optional second organic silicon compound represented by formula (I) and/or a condensate thereof;
• and
• c) a thermosetting compound, excluding an olefin polymer;
• wherein:
• the thermosetting compound has a solubility parameter (SP2) obtained by Fedors' estimation method;
• the first organic silicon compound has a solubility parameter (SP1) of R obtained by Fedors' estimation method, and SP2−SP1≧1.6;
• the optional second organic silicon compound has a solubility parameter (SP3) of R obtained by Fedors' estimation method, and SP2−SP3<1.6;
• and
• a molar ratio of the first organic silicon compound to the optional second organic silicon compound is 5:5 to 10:0.