Polymer, monomer, resist composition, and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsMasayoshi Sagehashi, Koji Hasegawa, Masahiro Fukushima, Jun Hatakeyama, Kazuhiro Katayama
Life of this patent
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Abstract
A pattern forming process is provided comprising the steps of applying a resist composition comprising a polymer comprising recurring units having formula (1a) and/or (1b), an acid generator and a solvent onto a substrate, baking to form a resist film, exposing the resist film to high-energy radiation, baking, and developing in an alkaline developer to form a negative tone pattern.
Claims9
A polymer comprising recurring units having the formula (1a) and/or (1b) and recurring units having the formula (1c):
- wherein R1 is hydrogen or methyl, R2 and R3 are each independently a straight, branched or cyclic C1-C6 monovalent hydrocarbon group, R2 and R3 may bond together to form an alicyclic group with the carbon atom to which they are attached, Xa and Xb are each independently a single bond, methylene or ethylidene, Za is a branched or cyclic C1-C9 divalent aliphatic hydrocarbon group, Zb is an atomic group necessary to form a C3-C10 alicyclic group with the carbon atoms to which it is attached, with the proviso that the total number of carbon atoms in each formula is such as to meet 6≦Xa+Za+R2+R3≦12 when Za is acyclic, or 5≦Xa+Za+R2+R3≦12 when Za is cyclic, and 5≦Xb+Zb+R2≦12,
- R4 and R5 are each independently a straight, branched or cyclic C1-C10 monovalent hydrocarbon group, R4 and R5 may bond together to form an alicyclic group with the carbon atom to which they are attached, X1 is a straight, branched or cyclic C1-C20 divalent hydrocarbon group in which any constituent —CH2— moiety may be replaced by —O— or —C(═O)—, Z1 is a straight, branched or cyclic C1-C20 tri- to pentavalent aliphatic hydrocarbon group in which any constituent —CH2— moiety may be replaced by —O— or —C(═O)—, k1 is 0 or 1, and k2 is an integer of 2 to 4.
A polymer comprising recurring units having the formula (1a) and/or (1b) and recurring units of at least one type selected from the formulae (A), (B) and (D):
- wherein R1 is hydrogen or methyl, R2 and R3 are each independently a straight, branched or cyclic C1-C6 monovalent hydrocarbon group, R2 and R3 may bond together to form an alicyclic group with the carbon atom to which they are attached, Xa and Xb are each independently a single bond, methylene or ethylidene, Za is a branched or cyclic C1-C9 divalent aliphatic hydrocarbon group, Zb is an atomic group necessary to form a C3-C10 alicyclic group with the carbon atoms to which it is attached, with the proviso that the total number of carbon atoms in each formula is such as to meet 6≦Xa+Za+R2+R3≦12 when Za is acyclic, or 5≦Xa+Za+R2+R3≦12 when Za is cyclic, and 5≦Xb+Zb+R2≦12,
- wherein the C3-C10 alicyclic group is selected from the group consisting of the following formulae:
- wherein the broken line denotes a valence bond,
- wherein R1 is hydrogen or methyl, ZA is a C1-C20 fluoroalcohol-containing group, ZB is a C1-C20 phenolic hydroxyl-containing group, ZD is a group containing a lactone structure, sultone structure, carbonate structure, acid anhydride structure, alkoxycarbonyl moiety, sulfonamide moiety or carbamoyl moiety, X2 is a single bond, methylene, ethylene, phenylene, fluorinated phenylene, naphthylene, —O—R01—, or —C(═O)—Z2—R01—, Z2 is oxygen or NH, R01 is a straight, branched or cyclic C1-C6 alkylene, straight, branched or cyclic C2-C6 alkenylene, phenylene or naphthylene group, which may contain a carbonyl, ester, ether or hydroxyl moiety,
- wherein the recurring unit of formula (B) is selected from the group consisting of the following formulae:
Dependencies are inferred from the claim text.