Method for the manufacture of synthetic quartz glass
AssigneeHeraeus Quarzglas GmbH & Co. KG
InventorsIan George Sayce, Martin Trommer
Life of this patent
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Abstract
One aspect relates to a method for the production of synthetic quartz glass. Moreover, one aspect relates to a polyalkylsiloxane compound, which includes certain specifications with respect to chlorine content, metallic impurities content, and residual moisture, as well as the use thereof for the production of synthetic quartz glass. One aspect also relates to a synthetic quartz glass that can be obtained according to the method of one embodiment.
Claims20
A method for the production of synthetic quartz glass, comprising:
- (a) evaporating a production material that contains at least one polymerisable polyalkylsiloxane compound while forming a production material vapor;
- (b) supplying the production material vapor resulting from (a) to a reaction zone, in which the production material is converted to SiO2 particles through pyrolysis or hydrolysis;
- (c) depositing the SiO2 particles resulting from (b) on a deposition surface;
- and
- (d) if applicable, drying and vitrifying the SiO2 particles resulting from (c) while forming synthetic quartz glass;
- wherein the at least one polyalkylsiloxane compound comprises a chlorine content of up to 550 ppb and a metallic impurities content of chromium (Cr) and zinc (Zn) of, added up, up to 25 ppb;
- and
- wherein the at least one polyalkylsiloxane compound comprises a residual moisture content of up to 150 ppm.
A method for the production of synthetic quartz glass, comprising:
- (a) evaporating a production material that contains at least one polymerisable polyalkylsiloxane compound while forming a production material vapor;
- (b) supplying the production material vapor resulting from (a) to a reaction zone, in which the production material is converted to SiO2 particles through pyrolysis or hydrolysis;
- (c) depositing the SiO2 particles resulting from (b) on a deposition surface;
- and
- (d) if applicable, drying and vitrifying the SiO2 particles resulting from (c) while forming synthetic quartz glass;
- wherein the at least one polyalkylsiloxane compound comprises a chlorine content of up to 550 ppb and a metallic impurities content of chromium (Cr) and zinc (Zn) of, added up, up to 25 ppb;
- and
- wherein the at least one polyalkylsiloxane compound comprises a metallic impurities content of Zn and Cr of at least 2 ppb.
A method for the production of synthetic quartz glass, comprising:
- (a) evaporating a production material that contains at least one polymerisable polyalkylsiloxane compound while forming a production material vapor;
- (b) supplying the production material vapor resulting from (a) to a reaction zone, in which the production material is converted to SiO2 particles through pyrolysis or hydrolysis;
- (c) depositing the SiO2 particles resulting from (b) on a deposition surface;
- and
- (d) if applicable, drying and vitrifying the SiO2 particles resulting from (c) while forming synthetic quartz glass;
- wherein the at least one polyalkylsiloxane compound comprises a chlorine content of up to 550 ppb and a metallic impurities content of chromium (Cr) and zinc (Zn) of, added up, up to 25 ppb;
- and
- wherein the at least one polyalkylsiloxane compound comprises a residual moisture content of at least 3 ppm.
Dependencies are inferred from the claim text.