Process for treating fluid
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsShing-Fong Wu, Yung-Ti Hung, Shih-Pao Chien, Yen-Chen Chen
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsShing-Fong Wu, Yung-Ti Hung, Shih-Pao Chien, Yen-Chen Chen
Estimating the term…
Embodiments of a process for treating a fluid are provided. The process for treating a fluid includes supplying a first fluid to a circulating chamber and introducing a first gas to the first fluid. A portion of the first gas is dissolved in the first fluid and a portion of the first gas is held in a head space portion of the circulating chamber. The process further includes mixing a portion of the first fluid drawn out from the circulating chamber and a portion of the first gas drawn out from the head space portion to form a mixture. The process further includes spraying the mixture back into the circulating chamber by a two-fluid nozzle. In addition, the first gas is further dissolved into the first fluid to form a high conductivity fluid. The process further includes draining the high conductivity fluid from the circulating chamber.
A process for treating a fluid, comprising:
A process for treating a fluid, comprising:
A process for treating a fluid, comprising:
Dependencies are inferred from the claim text.