Nanoporous silicon nitride membranes, and methods for making and using such membranes
AssigneeSiMPore Inc.
InventorsChristopher C. Striemer, Jon-Paul DesOrmeaux
Life of this patent
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Abstract
Provided are nanoporous silicon nitride membranes and methods of making such membranes. The membranes can be part of a monolithic structure or free-standing. The membranes can be made by transfer of the nanoporous structure of a nanoporous silicon or silicon oxide film by, for example, reactive ion etching. The membranes can be used in, for example, filtration applications, hemodialysis applications, hemodialysis devices, laboratory separation devices, multi-well cell culture devices, electronic biosensors, optical biosensors, active pre-concentration filters for microfluidic devices.
Claims29
A method for forming a nanoporous SiN layer comprising the steps of:
- forming a porous nanocrystalline silicon (pnc-Si) layer or porous silicon oxide layer that is directly disposed on an SiN layer;
- and
- etching said SiN layer such that a nanoporous SiN layer is formed.
A method for forming a free-standing nanoporous SiN layer comprising the steps of:
- forming nanopores in an SiN layer, wherein said SiN layer is disposed on a first layer and said first layer is disposed on a second layer, wherein said first layer is selected from the group consisting of Si and an oxide;
- and
- removing said first layer from between said SiN layer and said second layer such that a free-standing nanoporous SiN layer is formed.
A method for forming a free-standing nanoporous SiN layer comprising the steps of:
- forming nanopores in an SiN layer, wherein said SiN layer is disposed on an Si layer and said Si layer is disposed on a second layer;
- and
- removing said Si layer between said SiN layer and said second layer using XeF2 such that a free-standing nanoporous SiN layer is formed.
Dependencies are inferred from the claim text.