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US 9,777,368 B2Granted
Chemical vapor deposition coating, article, and method
AssigneeSilcotek Corp.
InventorsDavid A. Smith, James B. Mattzela, Paul H. Silvis, Gary A. Barone
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Abstract
The present invention relates to a chemical vapor deposition coating, a chemical vapor deposition article, and a chemical vapor deposition method. The coating, article, and method involve thermal decomposition of dimethylsilane to achieve desired surface properties.
Claims17
A thermal chemical vapor deposition method, the method comprising:
- preparing a substrate in a chemical vapor deposition chamber;
- thermally decomposing dimethylsilane in the chemical vapor deposition chamber to form a coating on the substrate, the thermally decomposing being at a pressure of between 1.0 p.s.i.a. and 100 p.s.i.a., at a temperature between 300° C. and 600° C., and for a duration of 30 minutes to 24 hours, the substrate being a metallic substrate, glass substrate, or ceramic substrate;
- functionalizing at least a portion of the coating by introducing a binding agent to form a functionalized layer;
- wherein the functionalizing is performed by reacting the surface with silicon hydride moieties remaining from an original carbosilane deposition provided by the thermal decomposition of dimethylsilane.
1 more element
A thermal chemical vapor deposition method, the method comprising:
- preparing a substrate in a chemical vapor deposition chamber;
- thermally decomposing dimethylsilane in the chemical vapor deposition chamber to form a coating on the substrate, the thermally decomposing being at a pressure of between 1.0 p.s.i.a. and 100 p.s.i.a., at a temperature between 300° C. and 600° C., and for a duration of 30 minutes to 24 hours, the substrate being a metallic substrate, glass substrate, or ceramic substrate;
- and
- oxidizing at least a portion of the coating by applying an oxidizing reagent;
- wherein the thermally decomposing of the dimethylsilane is performed without decompositional energies from plasma or microwave energies.
2 more elements
Dependencies are inferred from the claim text.