Apparatus for treating a gas in a conduit

An apparatus for treating a gas in a conduit of a substrate processing system, comprising:

• a dielectric tube configured to be coupled to a conduit of a substrate processing system to allow a flow of gases through the dielectric tube, wherein the dielectric tube has a conical sidewall;
• a radio frequency (RF) coil wound about an outer surface of the conical sidewall of the dielectric tube, wherein the RF coil is hollow and includes a first coolant fitting coupled and a second coolant fitting coupled to the RF coil to facilitate flow of a coolant through the RF coil;
• one or more first terminals and one or more second terminals coupled to the RF coil to facilitate coupling RF power to the RF coil;
• a first end flange coupled to a first end of the dielectric tube;
• and
• a second end flange coupled to a second end of the dielectric tube, wherein each of the first and second end flanges are configured to couple the dielectric tube in-line with a conduit.

A substrate processing system, comprising:

• a process chamber;
• an exhaust conduit coupled to the process chamber to allow a flow of exhaust gases from the process chamber;
• a vacuum pump coupled to the exhaust conduit to evacuate exhaust gases from the process chamber through the exhaust conduit;
• a dielectric tube coupled to the exhaust conduit to allow a flow of the exhaust gases through the dielectric tube, wherein the dielectric tube has a conical sidewall;
• and
• a radio frequency (RF) coil wound about an outer surface of the conical sidewall of the dielectric tube.