# US 9,758,862 B2 · Sputtering apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 9,758,862 B2 - Document ID: US9758862B2 - Status: Granted - Kind: B2 - Application number: 14/016,693 - Filed: 2013-09-03 - Published: 2014-03-06 - Granted: 2017-09-12 - Earliest claimed: 2012-09-04 - Assignees: Sputtering Components, Inc. - Applicants: Sputtering Components, Inc. - Inventors: Patrick Lawrence Morse - Web page: https://patentgrep.com/patent/US9758862B2 ## CPC - C23C 14/35: by application of a magnetic field, e.g. magnetron sputtering {(C23C14/3457 takes precedence)} - H01J 37/3405: {Magnetron sputtering} - H01J 37/3452: {Magnet distribution} - H01J 37/342: {Hollow targets} - H01J 37/345: {Magnet arrangements in particular for cathodic sputtering apparatus (material of magnets or magnets in general H01F1/00, H01F7/00)} - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract One embodiment is directed to a magnetron assembly comprising a plurality of magnets, and a yoke configured to hold the plurality of magnets in at least four straight, parallel, independent linear arrays. The plurality of magnets is arranged in the yoke so as to form a pattern comprising an outer portion and an inner portion, wherein the outer portion substantially surrounds the perimeter of the inner portion. The end portions of the linear array comprise a pair of turnaround sections, wherein each turnaround section substantially spans respective ends of the pair of elongated sections of the outer portion. The magnets in each turnaround section are arranged to form at least two or more different curves in the magnetic field that are offset from each along the target rotation axis. ## Claims ### Claim 1 A magnetron assembly comprising: a plurality of magnets configured to produce a plasma confinement path magnetic field; and a yoke configured to hold the plurality of magnets in at least four straight, parallel, independent linear arrays; wherein the plurality of magnets is arranged on the yoke so as to form a pattern comprising an outer portion and an inner portion, wherein the outer portion substantially surrounds a perimeter of the inner portion; wherein end portions of the linear arrays comprise a pair of turnaround sections, wherein each turnaround section substantially spans respective ends of a pair of elongated sections of the outer portion; wherein the magnetic field produced by the inner portion is coupled to the magnetic field produced by the outer portion to form one continuous plasma confinement path; and wherein the magnets in each turnaround section are arranged to break up a turnaround curve formed by the one continuous plasma confinement path into two or more different curves that are offset from each other along a target rotation axis. ### Claim 2 (depends on 1) The magnetron assembly of claim 1, wherein the magnets in each turnaround section are arranged so resulting target erosion components of each curve do not overlap each other as a target material rotates. ### Claim 3 (depends on 1) The magnetron assembly of claim 1, wherein the magnets are arranged in each turnaround section so that each of the two or more different curves in the one continuous plasma confinement path in that turnaround section is formed between two magnets having magnetic poles that are turned relative to one another. ### Claim 4 (depends on 1) The magnetron assembly of claim 1, wherein the magnets are arranged in each turnaround section so that each of the two or more different curves in the one continuous plasma confinement path in that turnaround section is formed between two or more magnets having magnetic poles that are turned at least 90 degrees relative to one another. ### Claim 5 (depends on 1) The magnetron assembly of claim 1, wherein the linear arrays of magnets are arranged to form a radial pattern, a stair-step pattern, or a flat pattern on the yoke. ### Claim 6 (depends on 1) The magnetron assembly of claim 1, wherein at least one of the plurality of magnets has a geometry, size, orientation, or magnetic strength that differs from at least one of the other magnets. ### Claim 7 (depends on 1) The magnetron assembly of claim 1, wherein the outer portion of the pattern includes the pair of turnaround sections, wherein each of the turnaround sections comprises two or more steps. ### Claim 8 (depends on 1) The magnetron assembly of claim 1, wherein the yoke is configured so that the pattern formed by the plurality of magnets can be re-configured without modification to the design of the yoke. ### Claim 9 A sputtering system comprising: a chamber through which a substrate moves; and a cathode assembly comprising: an elongated rotatable cylindrical tube mounted in the chamber and having a target surface; and a magnetron assembly positioned within the elongated rotatable cylindrical tube, the magnetron assembly comprising: a plurality of magnets configured to produce a plasma confinement path magnetic field on the target surface; and a yoke configured to hold the plurality of magnets in at least four straight, parallel, independent linear arrays; wherein the plurality of magnets is arranged on the yoke so as to form a pattern comprising an outer portion and an inner portion, wherein the outer portion substantially surrounds a perimeter of the inner portion; wherein end portions of the linear arrays comprise a pair of turnaround sections, wherein each turnaround section substantially spans respective ends of a pair of elongated sections of the outer portion; wherein the magnetic field produced by the inner portion is coupled to the magnetic field produced by the outer portion to form one continuous plasma confinement path; and wherein the magnets in each turnaround section are arranged to break up a turnaround curve formed by the one continuous plasma confinement path into two or more different curves that are offset from each other along a target rotation axis. ### Claim 10 (depends on 9) The system of claim 9, wherein the magnets in each turnaround section are arranged so resulting target erosion components of each curve do not overlap each other as the target surface rotates. ### Claim 11 (depends on 9) The system of claim 9, wherein the magnets are arranged in each turnaround section so that each of the two or more different curves in the one continuous plasma confinement path in that turnaround section is formed between two magnets having magnetic poles that are turned relative to one another. ### Claim 12 (depends on 9) The system of claim 9, wherein the magnets are arranged in each turnaround section so that each of the two or more different curves in the one continuous plasma confinement path in that turnaround section is formed between two or more magnets having magnetic poles that are turned at least 90 degrees relative to one another. ### Claim 13 (depends on 9) The system of claim 9, wherein the linear arrays of magnets are arranged to form a radial pattern, a stair-step pattern, or a flat pattern on the yoke. ### Claim 14 (depends on 9) The system of claim 9, wherein at least one of the plurality of magnets has a geometry, size, orientation, or magnetic strength that differs from at least one of the other magnets. ### Claim 15 (depends on 9) The system of claim 9, wherein the outer portion of the pattern includes the pair of turnaround sections, wherein each of the turnaround sections comprises two or more steps. ### Claim 16 (depends on 9) The system of claim 9, wherein the yoke is configured so that the pattern formed by the plurality of magnets can be re-configured without modification to the design of the yoke. ### Claim 17 (depends on 9) The system of claim 9, further comprising a drive system to support and rotate the elongated rotatable cylindrical tube. ### Claim 18 (depends on 9) The system of claim 9, wherein the system is configured to form a plasma within the chamber in connection with depositing a film on the substrate as it moves through the chamber. ### Claim 19 A method of sputtering material on a substrate, the method comprising: forming a pattern of magnets as a part of a magnetron assembly disposed within an elongated rotatable cylindrical tube, wherein the elongated rotatable cylindrical tube comprises a target surface; mounting the elongated rotatable cylindrical tube in a chamber; maintaining a vacuum in the chamber; rotating the elongated rotatable cylindrical tube within the chamber; supplying a magnetic flux at the target surface using the magnetron assembly; and moving the substrate within the chamber near the target surface; wherein the magnetron assembly comprises: a plurality of magnets configured to produce a plasma confinement path magnetic field on the target surface; and a yoke configured to hold the plurality of magnets in at least four straight, parallel, independent linear arrays; wherein the plurality of magnets is arranged on the yoke so as to form a pattern comprising an outer portion and an inner portion, wherein the outer portion substantially surrounds a perimeter of the inner portion; wherein end portions of the linear arrays comprise a pair of turnaround sections, wherein each turnaround section substantially spans respective ends of a pair of elongated sections of the outer portion; wherein the magnetic field produced by the inner portion is coupled to the magnetic field produced by the outer portion to form one continuous plasma confinement path; and wherein the magnets in each turnaround section are arranged to break up a turnaround curve formed by the one continuous plasma confinement path into two or more different curves that are offset from each other along a target rotation axis. ### Claim 20 (depends on 19) The method of claim 19, wherein the magnets in each turnaround section are arranged so resulting target erosion components of each curve do not overlap each other as a target material rotates.