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US 9,754,987 B2Granted
Image sensors and methods of forming the same
AssigneeSamsung Electronics Co., Ltd.
InventorYun Ki Lee
Life of this patent
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Abstract
An image sensor includes a substrate including a light-receiving region and a light-shielding region, a device isolation pattern in the substrate of the light-receiving region to define active pixels, and a device isolation region in the substrate of the light-shielding region to define reference pixels. An isolation technique of the device isolation pattern is different from that of the device isolation region.
Claims19
An image sensor comprising:
- a substrate including,
- a light-receiving region, and
- a light-shielding region;
- a device isolation pattern in the light-receiving region of the substrate, the device isolation pattern configured to define active pixels;
- and
- a device isolation region in the light-shielding region of the substrate, the device isolation region configured to define reference pixels, the device isolation pattern including a different material from a material of the device isolation region.
3 more elements
An image sensor comprising:
- a substrate including active pixels and reference pixels,
- the active pixels being defined by a device isolation pattern filling a trench formed in the substrate, and
- the reference pixels being defined by a dopant region including a portion of the substrate including dopants.
An image sensor comprising:
- a substrate including,
- a light-receiving region including a device isolation pattern, the device isolation pattern defining active pixels;
- and
- a light-shielding region including a device isolation region, the device isolation region defining reference pixels;
- wherein the device isolation pattern includes a different material than the device isolation region.
2 more elements
Dependencies are inferred from the claim text.