US 9,754,976 B2Granted

Liquid crystal display and element substrate thereof

AssigneeInnolux Corporation

InventorsYueh-Ting Chung, Shao-Wu Hsu, Yung-Hsin Lu, Jyun-Yu Chen, Kuan-Yu Chiu, Chao-Hsiang Wang

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Abstract

An element substrate is provided, including a substrate, a metal layer, a planarization layer and a first conductive layer. The metal layer is disposed on the substrate. The planarization layer is located on the metal layer, wherein the planarization layer includes a contact hole, the contact hole has a continuous wall and a bottom, the bottom exposes the metal layer, and the bottom of the contact hole has a first width. The first conductive layer is located on the planarization layer, wherein the first conductive layer includes an opening, the opening exposes the contact hole, and the opening has a second width above the contact hole, wherein the relationship of the first width and the second width is modified to decrease illumination loss and to prevent problems of shot-circuiting and insufficient capacitance.

Claims14

Dependent claims

An element substrate, comprising:

a substrate;
a metal layer, disposed on the substrate;
a planarization layer, located on the metal layer, wherein the planarization layer comprises a top surface, a bottom surface, and a contact hole, wherein the contact hole has a curved continuous wall and a hole bottom, the curved continuous wall disposed between the top surface of the planarization layer and the bottom surface of the planarization layer, the hole bottom of the contact hole exposes the metal layer, and the hole bottom of the contact hole has a first width;
a first conductive layer, located on the top surface of the planarization layer, wherein the first conductive layer comprises an opening, the opening exposes the contact hole, and the opening has a second width;
wherein the first width and the second width satisfy the following equation:
2
*
{
L
1
2
+
0.95
⁢
⁢
h
ln
⁡
(
0.05
)
·
tan
⁡
(
1.5
⁢
θ
)
·
ln
⁡
[
-
0.134
ln
⁡
(
0.05
)
·
tan
⁡
(
1.5
⁢
θ
)
]
}
≤
L
2
≤
2
*
{
L
1
2
+
0.95
⁢
⁢
h
ln
⁡
(
0.05
)
·
tan
⁡
(
1.5
⁢
θ
)
·
ln
⁡
[
-
0.00166
ln
⁡
(
0.05
)
·
tan
⁡
(
1.5
⁢
θ
)
]
}
wherein L1 is the first width, L2 is the second width, h is a thickness of the planarization layer from the top surface to the bottom surface, and θ is an included angle between a straight line and an extension surface of the hole bottom, wherein L1, L2 and h are values of micrometer units and θ is an angle type of degrees (°), wherein the straight line connects a reference point and a base point, wherein the base point is located at a point where the curved continuous wall is connected to the hole bottom of the contact hole, wherein the reference point is located on the curved continuous wall, the reference point is adjacent to an end of the first conductive layer, and a vertical distance from the reference point to the hole bottom is 0.95 h, and wherein an interval is located between the reference point and the end of the first conductive layer which is adjacent to the reference point.

97 more elements

A liquid crystal display, comprising:

an opposite substrate;
an element substrate, facing the opposite substrate;
a liquid crystal layer disposed between the opposite substrate and the element substrate, wherein the element substrate comprises:
a substrate;
a metal layer, disposed on the substrate;
a planarization layer, located on the metal layer, wherein the planarization layer comprises a top surface, a bottom surface, and a contact hole, wherein the contact hole has a curved continuous wall and a hole bottom, the curved continuous wall disposed between the top surface of the planarization layer and the bottom surface of the planarization layer, the hole bottom of the contact hole exposes the metal layer, and the hole bottom of the contact hole has a first width;
a first conductive layer, located on the top surface of the planarization layer, wherein the first conductive layer comprises an opening, the opening exposes the contact hole, and the opening has a second width;
wherein the first width and the second width satisfy the following equation:
2
*
{
L
1
2
+
0.95
⁢
⁢
h
ln
⁡
(
0.05
)
·
tan
⁡
(
1.5
⁢
θ
)
·
ln
⁡
[
-
0.134
ln
⁡
(
0.05
)
·
tan
⁡
(
1.5
⁢
θ
)
]
}
≤
L
2
≤
2
*
{
L
1
2
+
0.95
⁢
⁢
h
ln
⁡
(
0.05
)
·
tan
⁡
(
1.5
⁢
θ
)
·
ln
⁡
[
-
0.00166
ln
⁡
(
0.05
)
·
tan
⁡
(
1.5
⁢
θ
)
]
}
wherein L1 is the first width, L2 is the second width, h is a thickness of the planarization layer from the top surface to the bottom surface, and θ is an included angle between a straight line and an extension surface of the hole bottom, wherein L1, L2 and h are values of micrometer units and θ is an angle type of degrees (°), wherein the straight line connects a reference point and a base point, wherein the base point is located at a point where the curved continuous wall is connected to the hole bottom of the contact hole, wherein the reference point is located on the curved continuous wall, the reference point is adjacent to an end of the first conductive layer, and a vertical distance from the reference point to the hole bottom is 0.95 h, and wherein an interval is located between the reference point and the end of the first conductive layer which is adjacent to the reference point.

100 more elements

Dependencies are inferred from the claim text.

Facts

Application: 14/533,052Filed 4 Nov 2014
Priority: TW 103131296 A11 Sep 2014
Published: US 2016/0079279 A117 Mar 2016
Granted: 5 Sep 2017
Term ends: Not estimatedThe source records don’t support an estimate.

Classification6 codes

H10D 86/60
Characterised by multiple TFTs: wherein the TFTs are in active matrices
G02F 1/136227
Active matrix addressed cells: through-hole connection of the pixel electrode to the active element through an insulation layer
H10D 86/441
Characterised by multiple TFTs: interconnections, e.g. scanning lines
G02F 1/134372
Characterised by their geometrical arrangement: for fringe field switching [FFS] where the common electrode is not patterned