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US 9,754,812 B2Granted
Adaptable end effector
AssigneeCamtek Ltd.
InventorArnon Ben-Natan
Life of this patent
Estimating the term…
Abstract
An adaptable end effector may include a substrate interface may be configured to support a substrate. The substrate interface may include multiple groups of vacuum openings that are associated with a plurality of types of substrates. A vacuum system may be configured to supply vacuum only to one or more selected groups of vacuum openings that are associated with a given type of substrates when the adaptable end effector supports a substrate of the given type of substrates.
Claims23
An adaptable end effector that comprises:
- a substrate interface that is configured to support a substrate;
- wherein the substrate interface comprises multiple groups of vacuum openings that are associated with a plurality of types of substrates;
- wherein the plurality of types of substrates comprise a diced substrate and a non-diced substrate;
- wherein the multiple groups of vacuum opening comprise a first group of vacuum openings that is associated with the diced substrate and a second group of vacuum openings that is associated with the non-diced substrate;
- a vacuum system that is configured to supply vacuum only to one or more selected groups of vacuum openings that are associated with a given type of substrates when the adaptable end effector supports a substrate of the given type of substrates;
- wherein the first group of vacuum openings comprises two first sub-groups of vacuum openings;
- wherein the second group of vacuum openings is positioned between the two first sub-groups of vacuum openings;
- and
- wherein at least one of the following is true:
- (i) wherein the second group of vacuum openings are formed within multiple trenches that are spaced apart from each other by elevated inter-trench areas;
- and
- (ii) the adaptable end effector comprises a pair of arms;
- wherein the two first sub-groups of vacuum openings comprise (a) proximal peripheral vacuum openings that are located in proximity to a proximal end of the adaptable end effector;
- and (b) distal peripheral vacuum openings that are located in proximity to a distal end of each of the pair of arms.
11 more elements
A method for supporting a substrate, the method comprises:
- selecting or receiving a selection of a given type of substrate that is either supported by an adaptable end effector or is scheduled to be supported by the adaptable end effector;
- and supplying vacuum only to one or more selected groups of vacuum openings that are associated with the given type of substrates;
- wherein the one or more selected group of vacuum openings belong to multiple groups of vacuum openings that are associated with a plurality of types of substrates;
- wherein the plurality of types of substrates comprise a diced substrate and a non-diced substrate;
- wherein the multiple groups of vacuum openings comprise a first group of vacuum openings that is associated with a diced substrate and a second group of vacuum openings that is associated with a non-diced substrate;
- wherein at least one of the following is true:
- (i) the second group of vacuum openings are formed within multiple trenches that are spaced apart from each other by elevated inter-trench areas;
- and
- (ii) the adaptable end effector comprises a pair of arms;
- wherein the two first sub-groups of vacuum openings comprise (a) proximal peripheral vacuum openings that are located in proximity to a proximal end of the adaptable end effector;
- and (b) distal peripheral vacuum openings that are located in proximity to a distal end of each of the pair of arms.
8 more elements
Dependencies are inferred from the claim text.